Selective deposition of lipid membranes on locally anodic-oxidized silicon surface

e-Journal of Surface Science and Nanotechnology

Volumn 9, Issue , 2011, Pages 357-362

  Nakamura, Masaya ^a   Isono, Toshinari ^a   Ogino, Toshio ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy; Local anodic oxidation; Self assembly; Silicon oxides; Sup ported lipid membrane; Surface chemical reaction

Indexed keywords

ATOMIC FORCE MICROSCOPY; BIOMOLECULES; DEPOSITION; HYDROPHILICITY; LIPIDS; SELF ASSEMBLY; SILICA; SILICON OXIDES; SURFACE REACTIONS;

DIPALMITOYL PHOSPHATIDYLCHOLINE; LIPID MEMBRANES; LOCAL ANODIC OXIDATION; OCTADECYLTRIMETHOXYSILANE; OXIDIZED SILICON; SELECTIVE DEPOSITION; SURFACE CHEMICAL REACTIONS; SURFACE HYDROPHILICITY;

ANODIC OXIDATION;

EID: 80054039658     PISSN: None     EISSN: 13480391     Source Type: Journal    
DOI: 10.1380/ejssnt.2011.357     Document Type: Article

References (32)

1. R. H. Al-Shakhshir, F. E. Regnier, J. L. White, and S. L. Hem, Vaccine 13, 41 (1995).
2. R. Tero, H. Watanabe, and T. Urisu, Phys. Chem. Chem. Phys. 8, 3885 (2006).
3. T. Isono, H. Tanaka, and T. Ogino, e-J. Surf. Sci. Nanotech. 5, 1 (2007).
4. M. Veiseh, Y. Zhang, K. Hinkley, and M. Zhang, Biomed. Microdevices 3, 45 (2001).
5. C. D. W. Wilkinson, A. S. G. Curtis, and J. Crossan, J. Vac. Sci. Technol. B 16, 3132 (1998).
6. D. Falconnet, D. Pasqui, S. Park, R. Eckert, H. Schift, J. Gobrecht, R. Barbucci, and M. Textor, Nano Lett. 4, 1909 (2004).
7. L. A. Chrisey, C. E. O'Ferrall, B. J. Spargo, C. S. Dulcey, and J. M. Calvert, Nucl. Acids Res. 24, 3040 (1996).
8. T. Thundat, L. A. Nagahara, P. I. Oden, S. M. Lindsay, M. A. George, and W. S. Glaunsinger, J. Vac. Sci. Tech-nol. A 8, 3537 (1990).
9. J. A. Dagata, J. Schneir, H. H. Harary, C. J. Evans, M. T. Postek, and J. Bennett, Appl. Phys. Lett. 56, 2001 (1990).
10. H. C. Day and D. R. Allee, Appl. Phys. Lett. 62, 2691 (1993).
11. M. Yasutake, Y. Ejiri, and T. Hattori, Jpn. J. Appl. Phys. 32, L1021 (1993).
12. Y. Mo, Y. Wang, and M. Bai, Physica E 41, 146 (2008).
13. H. Sugimura, T. Uchida, N. Kitamura, and H. Masuhara, J. Phys. Chem. 98, 4352 (1994).
14. C. Huh and S.-J. Park, J. Vac. Sci. Technol. B 18, 55 (2000).
15. E. S. Snow, D. Park, and P. M. Campbell, Appl. Phys. Lett. 69, 269 (1996).
16. Z. Jiao, H. Zhang, M. Wu, H. Guo, J. Wang, B. Zhao, and G. Ding, J. Mater. Sci.: Mater. Electron. 20, 177 (2009).
17. F. Marchi, V. Bouchiat, H. Dallaporta, V. Safarov, D. Tonneau, and P. Doppelt, J. Vac. Sci. Technol. B 16, 2952 (1998).
18. Y. Mo, W. Zhao, D. Huang, F. Zhao, and M. Bai, Ultramicroscopy 109, 247 (2009).
19. J. Han, D. Kasahara, T. Ichii, K. Murase, and H. Sugimura, J. Vac. Sci. Technol. B 27, 928 (2009).
20. Y. Kashiwase, T. Oya, and T. Ogino, Jpn. J. Appl. Phys. 47, 6105 (2008).
21. Y. Kashiwase and T. Ogino, Jpn. J. Appl. Phys. 48, 056512 (2009).
22. G. Mayer and N. M. Amer, Appl. Phys. Lett. 57, 2089 (1990).
23. M. Binggeli and C. M. Mate, Appl. Phys. Lett. 65, 415 (1994).
24. H. Sugimura, N. Nakagiri, and N. Ichinose, Appl. Phys. Lett. 66, 3686 (1995).
25. M. Fujihira, D. Aoki, Y. Okabe, H. Takano, H. Hokari, J. Frommer, Y. Nagatani, and F. Sakai, Chem. Lett. 7, 499 (1996).
26. A. Opitz, S. I.-U. Ahmed, J. A. Schaefer, and M. Scherge, Surf. Sci. 504, 199 (2002).
27. O. Sneh, M. A. Cameron, and S. M. George, Surf. Sci. 364, 61 (1996).
28. G. Maulucci, M. De Spirito, G. Arcovito, F. Boffi, A. C. Castellano, and G. Briganti, Biophys. J. 88, 3545 (2005).
29. I.-S. Chuang and G. E. Maciel, J. Phys. Chem. B 101, 3052 (1997).
30. S. Terrettaz, T. Stora, C. Duschi, and H. Vogel, Langmuir 9, 1361 (1993).
31. T. Isono, T. Ikeda, and T. Ogino, Langmuir 26, 9607 (2010).
32. M. Nakamura and T. Ogino, Jpn. J. Appl. Phys. 50, 035202 (2011).