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Langmuir

Volumn 27, Issue 20, 2011, Pages 12499-12505

Deposition from dopamine solutions at Ge substrates: An in situ ATR-FTIR study

(2) Müller, Martin a Keßler, Bernd a

a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBED SPECIES; ATR FTIR; ATTENUATED TOTAL REFLECTION FOURIER TRANSFORM INFRARED; CONCENTRATION DEPENDENCE; DEPOSITION LEVELS; DEPOSITION TIME; END GROUPS; EXPONENTIAL DAMPING; EXPONENTIAL DECAY FUNCTIONS; GE SUBSTRATES; HYDROXYL GROUPS; IN-SITU; INTERNAL REFLECTION ELEMENTS; IR ABSORPTION; IR BANDS; IR SPECTRUM; KINETIC CONSTANT; MODEL SUBSTRATES; ORGANIC LAYERS; ORGANIC MATERIALS; SINGLE BOND; STATIONARY CONDITIONS; TIME DEPENDENT; TRIS BUFFERS; WEAK INTERACTIONS;

AGGLOMERATION; BRAIN; FOURIER TRANSFORMS; GERMANIUM; KINETICS; POLYMERS; RATE CONSTANTS; SURFACES; THICK FILMS;

DEPOSITION;

DOPAMINE; GERMANIUM;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMICAL STRUCTURE; CHEMISTRY; INFRARED SPECTROSCOPY; PH; SOLUTION AND SOLUBILITY; SURFACE PROPERTY;

DOPAMINE; GERMANIUM; HYDROGEN-ION CONCENTRATION; MICROSCOPY, ATOMIC FORCE; MOLECULAR STRUCTURE; SOLUTIONS; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES;

EID: 80054000410 PISSN: 07437463 EISSN: 15205827 Source Type: Journal
DOI: 10.1021/la202908b Document Type: Article

Times cited : (83)

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