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Volumn 110, Issue 6, 2011, Pages

Influence of net doping, excess carrier density and annealing on the boron oxygen related defect density in compensated n-type silicon

Author keywords

[No Author keywords available]

Indexed keywords

BORON-OXYGEN; BORON-OXYGEN COMPLEX; DOPANT CONCENTRATIONS; EXCESS CARRIERS; EXPERIMENTAL DATA; MINORITY CARRIER CONCENTRATION; N TYPE SILICON; OXYGEN DIMERS;

EID: 80053532616     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3633492     Document Type: Article
Times cited : (44)

References (23)
  • 5
    • 1442337113 scopus 로고    scopus 로고
    • 10.1103/PhysRevB.69.024107
    • J. Schmidt and K. Bothe, Phys. Rev. B 69, 024107 (2004). 10.1103/PhysRevB.69.024107
    • (2004) Phys. Rev. B , vol.69 , pp. 024107
    • Schmidt, J.1    Bothe, K.2
  • 12
    • 0015491489 scopus 로고
    • 10.1016/0038-1101(72)90131-1
    • F. Dannhuser, Solid-State Electron. 15, 1371 (1972). 10.1016/0038- 1101(72)90131-1
    • (1972) Solid-State Electron. , vol.15 , pp. 1371
    • Dannhuser, F.1
  • 13
    • 0015490309 scopus 로고
    • 10.1016/0038-1101(72)90132-3
    • J. Krausse, Solid-State Electron. 15, 1377 (1972). 10.1016/0038-1101(72) 90132-3
    • (1972) Solid-State Electron. , vol.15 , pp. 1377
    • Krausse, J.1
  • 14


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.