Radical modification of the wetting behavior of textiles coated with ZnO thin films and nanoparticles when changing the ambient pressure in the pulsed laser deposition process

Journal of Applied Physics

Volumn 110, Issue 6, 2011, Pages

  Popescu, A C ^a   Duta, L ^a   Dorcioman, G ^a   Mihailescu, I N ^a   Stan, G E ^b   Pasuk, I ^b   Zgura, I ^b   Beica, T ^b   Enculescu, I ^b   Ianculescu, A ^c   Dumitrescu, I ^d  

^a NATIONAL INSTITUTE FOR LASER   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

^d Research Development National Institute for Textiles and Leather   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT GAS; AMBIENT PRESSURES; CONTACT ANGLE METHOD; DEPOSITION CHAMBERS; ELECTRICAL CHARGING; FUNCTIONALIZED; HYDROPHOBIC SURFACES; IN-VACUUM; KRF EXCIMER LASER; LASER DEPOSITIONS; OXYGEN FLUXES; SUPERHYDROPHOBIC; WETTING BEHAVIOR; WOVEN FABRICS; ZNO THIN FILM;

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; DEPOSITION; EXCIMER LASERS; FABRICS; HYDROPHILICITY; HYDROPHOBICITY; KRYPTON; METALLIC FILMS; NANOPARTICLES; OPTICAL FILMS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; THIN FILMS; VAPOR DEPOSITION; WEAVING; WETTING; X RAY DIFFRACTION; ZINC OXIDE;

PULSED LASERS;

EID: 80053488391     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3639297     Document Type: Article

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