Direct and reliable patterning of plasmonic nanostructures with sub-10-nm gaps

ACS Nano

Volumn 5, Issue 9, 2011, Pages 7593-7600

  Duan, Huigao ^a   Hu, Hailong ^b   Kumar, Karthik ^a   Shen, Zexiang ^b   Yang, Joel K W ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

field enhancement; lift off; plasmon resonance; SERS; sub 10 nm gaps

Indexed keywords

FIELD ENHANCEMENT; LIFT-OFF; PLASMON RESONANCE; SERS; SUB-10-NM GAPS;

ELECTRON BEAM LITHOGRAPHY; FABRICATION; HYDROGEN; NANOSTRUCTURES; RAMAN SCATTERING; SURFACE PLASMON RESONANCE;

PLASMONS;

EID: 80053324702     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn2025868     Document Type: Article

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