A chemical kinetic model for chemical vapor deposition of carbon nanotubes

Applied Surface Science

Volumn 257, Issue 24, 2011, Pages 10562-10570

  Raji, K ^a   Thomas, Shijo ^a   Sobhan, C B ^a  

^a NATIONAL INSTITUTE OF TECHNOLOGY CALICUT   (India)

Author keywords

Carbon nanotubes; Chemical kinetic model; Chemical vapor deposition

Indexed keywords

ATOMS; BATCH REACTORS; CARBON NANOTUBES; KINETIC PARAMETERS; KINETIC THEORY; OPTIMIZATION; REACTION KINETICS; YARN;

CARBON NANOTUBE GROWTH; CHEMICAL KINETIC MODEL; CHEMICAL VAPOR DEPOSITIONS (CVD); COMPUTATIONAL RESULTS; CONTROLLABLE PARAMETERS; DEPOSITION PARAMETERS; DEPOSITION TEMPERATURES; ENERGY BALANCE EQUATIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 80052922039     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.07.051     Document Type: Article

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