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Volumn 85, Issue 10, 2011, Pages 2518-2523
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Nanostructure Cu2ZnSnS4 thin film prepared by sol-gel for optoelectronic applications
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Author keywords
Nanostructure cu2znsns4 thin film; Photovoltaic; Sol gel
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Indexed keywords
AFM IMAGE;
BARRIER HEIGHTS;
CU2ZNSNS4;
GLASS SUBSTRATES;
HETEROJUNCTION PHOTODIODES;
IDEALITY FACTORS;
INTERFACE STATE;
INTERFACE STATE DENSITY;
N TYPE SILICON;
NANOSTRUCTURE MATERIAL;
OPTOELECTRONIC APPLICATIONS;
PHOTOSENSOR;
PHOTOVOLTAIC;
RECTIFICATION BEHAVIOR;
SERIES RESISTANCES;
SOL-GEL TECHNIQUE;
ATOMIC FORCE MICROSCOPY;
CRYSTAL ATOMIC STRUCTURE;
CURRENT VOLTAGE CHARACTERISTICS;
DIODES;
ELECTRIC RECTIFIERS;
ENERGY GAP;
GELS;
HETEROJUNCTIONS;
NANOSTRUCTURES;
OPTICAL BAND GAPS;
PHOTOVOLTAIC EFFECTS;
SOL-GEL PROCESS;
SOL-GELS;
SOLS;
SUBSTRATES;
THIN FILMS;
COPPER;
ATOMIC FORCE MICROSCOPY;
ELECTRONIC EQUIPMENT;
FILM;
NANOTECHNOLOGY;
PARTICLE SIZE;
PHOTOVOLTAIC SYSTEM;
SUBSTRATE;
THIN SECTION;
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EID: 80052291371
PISSN: 0038092X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solener.2011.07.012 Document Type: Article |
Times cited : (50)
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References (20)
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