Determination of geometrical factors in Layerwise Laser Melting using optical process monitoring

Optics and Lasers in Engineering

Volumn 49, Issue 12, 2011, Pages 1440-1446

  Craeghs, Tom ^a   Clijsters, Stijn ^a   Yasa, Evren ^a   Bechmann, Florian ^b   Berumen, Sebastian ^b   Kruth, Jean Pierre ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b External Research Projects Standardization   (Germany)

Author keywords

High speed imaging; Layerwise Laser Melting; Monitoring; Signal processing

Indexed keywords

BASE PLATES; CMOS CAMERA; GEOMETRICAL FACTORS; HIGH SPEED IMAGING; INFLUENCING FACTOR; LASER MELTING; LAYER-WISE; LOCAL GEOMETRY; MELT POOL; METALLIC PART; NEAR INFRARED; OPTIMAL PROCESSING; PROCESSING RATES; PRODUCTION TECHNIQUES; REAL-TIME PROCESS MONITORING; SCANNING LASER BEAMS; SENSOR OUTPUT; SILICON PHOTODIODE; THIN LAYERS;

CMOS INTEGRATED CIRCUITS; DATA HANDLING; FIELD PROGRAMMABLE GATE ARRAYS (FPGA); LAKES; MELTING; PROCESS MONITORING; SCANNING; SENSORS; SIGNAL PROCESSING;

PROCESS CONTROL;

EID: 80052267969     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2011.06.016     Document Type: Article

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