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Volumn 52, Issue 7, 2011, Pages 1349-1355
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Structural analysis of Pd-Cu-Si metallic glassy alloy thin films with varying glass transition temperature
a
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Author keywords
Metallic glassy alloy; Palladium copper silicon alloy; Sputtering; Structural analysis; Thin film; X ray diffraction
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Indexed keywords
ATOMIC DISTANCES;
COORDINATION NUMBER;
CU CONTENT;
GLASSY ALLOYS;
PALLADIUM-COPPER-SILICON ALLOY;
PD ATOMS;
POSITIVE EFFECTS;
SHORT-RANGE ORDER;
SI ATOMS;
SI CONTENT;
SPUTTERING METHODS;
STRUCTURAL PARAMETER;
STRUCTURAL UNIT;
TRIGONAL PRISMS;
AMORPHOUS ALLOYS;
AMORPHOUS SILICON;
ATOMS;
COPPER;
GLASS;
PALLADIUM;
PRISMS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SILICON ALLOYS;
STRUCTURAL ANALYSIS;
TEMPERATURE;
THIN FILMS;
X RAY DIFFRACTION;
GLASS TRANSITION;
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EID: 80052256169
PISSN: 13459678
EISSN: None
Source Type: Journal
DOI: 10.2320/matertrans.M2011023 Document Type: Article |
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Times cited : (12)
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References (14)
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