Synthesis and investigation of electrodeposited half-metallic Fe 3O 4 Thin films and nanowires

Journal of Superconductivity and Novel Magnetism

Volumn 24, Issue 1-2, 2011, Pages 845-849

  Singh, Mamraj ^a   Chaudhary, Sujeet ^a   Kashyap, Subhash C ^a   Pandya, D K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Electrodeposition; Fe 3O 4; Half metallic systems; Magnetoresistance; Thin films

Indexed keywords

COATED GLASS; CONDUCTION MECHANISM; CYCLIC VOLTAMETRY; HALF-METALLIC; LONGITUDINAL MAGNETORESISTANCE; NONLINEAR I-V CHARACTERISTICS; POTENTIAL WINDOWS; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPES; THREE ELECTRODE CELLS; VIBRATING SAMPLE MAGNETOMETER;

ELECTRIC RESISTANCE; ELECTRODEPOSITION; ITO GLASS; MAGNETIC MATERIALS; MAGNETIC PROPERTIES; MAGNETOELECTRONICS; MAGNETORESISTANCE; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

NANOWIRES;

EID: 80052174967     PISSN: 15571939     EISSN: 15571947     Source Type: Journal    
DOI: 10.1007/s10948-010-1027-y     Document Type: Article

References (31)

1. Verwey, E. J.: Nature (London) 144, 327 (1939)
2. Anisimov, V. I., Elfimov, I. S., Hamada, N., Terakura, K.: Phys. Rev. B 54, 4387 (1996)
3. Coey, J. M. D., Chien, C. L.: MRS Bull. 720 (2003)
4. Coey, J. M. D., Venkatesan, M.: J. Appl. Phys. 91, 8345 (2002)
5. Zhang, L., Zhang, Y.: J. Magn. Magn. Mater. 321, L15 (2009)
6. He, K., Xu, C. Y., Zhen, L., Shao, W. Z.: J. Magn. Magn. Mater. 321, L15 (2009)
7. Chang, M. T., Hsieh, C. H., Chueh, Y. L., Wang, Z. L., Murakami, Y., Shindo, D.: Adv. Mater. 19, 2290 (2007)
8. Wang, H. W., Lin, H. C., Yeh, Y. C., Kuo, C. H.: J. Magn. Magn. Mater. 310, 2425 (2007)
9. Ensinger, W., Vater, P.: Mater. Sci. Eng. C 25, 609 (2005)
10. Gong, G. Q., Gupta, A., Xiao, G., Qian, W., Dravid, V. P.: Phys. Rev. B 56, 5096 (1997)
11. Li, X. W., Gupta, A., Xiao, G., Gong, G. Q.: J. Appl. Phys. 83, 7049 (1998)
12. Ogale, S. B., Ghosh, K., Sharma, R. P., Greene, R. L., Ramesh, R., Venkatesan, T.: Phys. Rev. B 57, 7823 (1998)
13. Tang, J., Wang, K. Y., Zhou, W.: J. Appl. Phys. 89, 7690 (2001)
14. Anderson, J. F., Kuhn, M., Diebold, U., Shaw, K., Stoyanov, P., Lind, D.: Phys. Rev. B 56, 9902 (1997)
15. Shaw, K. A., Lochner, E., Lind, D. M.: J. Appl. Phys. 87, 1727 (2000)
16. Lui, H., Jiang, E. Y., Bai, H. L., Zheng, R. K., Wei, H. L., Zhang, X. X.: Appl. Phys. Lett. 83, 3531 (2003)
17. Hong, J. P., Lee, S. B., Jung, Y. W., Lee, J. H., Yoon, K. S., Kim, K. W.: Appl. Phys. Lett. 83, 1590 (2003)
18. Mi, W. B., Shen, J. J., Jiang, E. Y., Bai, H. L.: Acta Mater. 55, 1919 (2007)
19. Sorenson, T. A., Mrten, S. A., Waddill, G. D., Switzer, J. A.: J. Am. Chem. Soc. 124, 7604 (2002)
20. Kothari, H. M., Kulp, E. A., Limmer, S. J., Poizot, P., Bohannan, E. W., Switzera, J. A.: J. Mater. Res. 21, 290 (2006)
21. Mitra, S., Poizot, P., Finke, A., Tarascon, J. M.: Adv. Funct. Mater. 16, 2281 (2006)
22. Coey, J. M. D., Berkowitz, A. E., Balcells, L., Putris, F. F., Parker, F. T.: Appl. Phys. Lett. 72, 734 (1998)
23. Terrier, C., Abid, M., Arm, C., Serrano-Guisan, S., Gravier, L., Ansermet, J.-Ph.: J. Appl. Phys. 98, 086102 (2005)
24. Cullity, B. D., Stock, S. R.: Elements of X-Ray Diffraction, 3rd edn., pp. 167-171. Prentice-Hall, New York (2001)
25. Lui, H., Jiang, E. Y., Bai, H. L., Zheng, R. K., Zhang, X. X.: J. Phys. D, Appl. Phys. 36, 2950 (2003)
26. Xu, Y., Ephron, D., Beasley, M. R.: Phys. Rev. B 52, 2843 (1995)
27. Simmons, J. G.: J. Appl. Phys. 34, 1793 (1963)
28. Guinea, F.: Phys. Rev. B 58, 9212 (1998)
29. Kazakova, O., Erts, D., Crowley, T. A., Kulkarni, J. S., Holmes, J. D.: J. Magn. Magn. Mater. 286, 171 (2009)
30. Xiao, J. Q., Jiang, J. S., Chien, C. L.: Phys. Rev. Lett. 68, 3749 (1992)
31. Ziese, M., Hohne, R., Semmelhack, H. C., Reckentin, H., Hong, N. H., Esquinazi, P.: Eur. Phys. J. B 28, 415 (2002)