Effect of Ag/N codoping on photoactivity of TiO2 thin film

Surface Engineering

Volumn 27, Issue 7, 2011, Pages 480-484

  Xu, K J ^a   Yang, W J ^b   Dong, S H ^a  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

^b SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Doping; Nano Ag N TiO2 films; Porous hadite; Sterilisation; Water processing

Indexed keywords

CO-DOPING; DEGRADATION RATE; ENERGY DISPERSIVE X RAY SPECTROSCOPY; MODIFIED SOL-GEL PROCESS; NANO AG/N-TIO2 FILMS; OIL-IN-WATER; PHOTOACTIVITY; PHOTOCATALYTIC ACTIVITIES; POROUS HADITE; TIO; WATER PROCESSING;

DEGRADATION; PHOTOCATALYSIS; SEWAGE; SOL-GEL PROCESS; TITANIUM DIOXIDE; WASTEWATER; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

SEMICONDUCTOR DOPING;

EID: 80052162192     PISSN: 02670844     EISSN: 17432944     Source Type: Journal    
DOI: 10.1179/026708410X12506873242868     Document Type: Article

References (21)

1. A. Fujishima and K. Honda: Nature, 1972, 37, 238-245.
2. M. Anpo and M. Takeuchi: J. Catal., 2003, 216, 505-516.
3. H. Yamashita, M. Takeuchi and M. Anpo: Encyclopedia Nanosci. Nanotechnol., 2004, 10, 639-645.
4. M. Iwasaki, M. Hara, H. Kawada, H. Tada and S. Ito: J. Colloid Interf. Sci., 2000, 224, 202-207.
5. S. Klosek and D. Raftery: J. Phys. Chem. B, 2001, 105B, 2815-2821.
6. J. F. Zhu, F. Chen, J. L. Zhang, H. J. Chen and M. Anpo: J. Photochem. Photobiol. A, 2006, 180A, 196-205.
7. E. Borgarello, J. Kiwi, M. Gratzel, E. Pelizzetti and M. Visca: J. Am. Chem. Soc., 1982, 104, 2996-3001.
8. R. Asahi, T. Morkawa, T. Ohwaki, K. Aoki and Y. Taga: Science, 2001, 293, 269-271.
9. M. Sokmen, F. Candan and Z. Sumer: J. Photochem. Photobiol. A, 2001, 143A, 241-250.
10. P. Falaras, I. M. Arabatzis, T. Stergiopoulos and M. C. Bernard: Int. J. Photoenerg., 2003, 5, 123-129.
11. H. Irie, Y. Watanabe and K. Hashimoto: Chem. Lett., 2003, 32, 772-775.
12. L. Lin, W. Lin, Y. X. Zhu, B. Y. Zhao and Y. C. Xie: Chem. Lett., 2005, 34, 284-287.
13. D. Li, H. Haneda, S. Hishita, N. Ohashi and K. L. Nitin: J. Fluorin. Chem., 2005, 126, 69-78.
14. C. Jimmy, J. G. Yu, W. K. Ho, Z. T. Jiang and L. Z. Zhang: Chem. Mater., 2002, 14, 3808-3817.
15. T. Ohno: Water Sci. Technol., 2004, 49, 159-161.
16. K. Nagaveni, M. S. Hedge, N. Ravishankar, G. N. Subbanna and G. Madras: Langmuir, 2004, 20, 2900-2905.
17. T. Morikawa, R. Asahi, T. Ohwaki, K. Aoki and Y. Taga: Jpn J. Appl. Phys., 2001, 40, 561-569.
18. T. Umebayashi, T. Yamaki, H. Itoh and K. Asai: Appl. Phys. Lett., 2002, 81, 454-457.
19. B. H. Dambar and J. K. Kenneth: J. Colloid Interf. Sci., 2007, 311, 514-526.
20. P. C. Maness, S. Smolinski, D. M. Blake, Z. Huang, E. J. Wolfrum and A. J. Willium: Appl. Environ. Microbiol., 1999, 65, 4094-4105.
21. Y. V. Kolen'ko, B. R. Churagulov,M. Kunst, L. Mazerolles and C. Colbeau-Justain: Appl. Catal. B, 2004, 54B, 51-62.