The fabrication of THz emitting mesas by reactive ion-beam etching of superconducting Bi2212 with multilayer masks

Journal of Superconductivity and Novel Magnetism

Volumn 24, Issue 1-2, 2011, Pages 1083-1086

  Koseoglu, H ^a   Turkoglu, F ^a   Simsek, Y ^a   Ozyuzer, L ^a  

^a IZMIR INSTITUTE OF TECHNOLOGY   (Turkey)

Author keywords

Bi2212; Intrinsic Josephson Junctions; Reactive ion beam etching; Terahertz radiation

Indexed keywords

BI-2212; INTRINSIC JOSEPHSON JUNCTION; ION BEAM ETCHING; ION ETCHING; LATERAL DIMENSION; MULTI-LAYER MASKS; PHOTORESIST MASK; TERAHERTZ RADIATION; THICK PHOTORESISTS; THZ RADIATION;

DIELECTRIC MATERIALS; FABRICATION; ION BEAMS; IONS; JOSEPHSON JUNCTION DEVICES; PHOTORESISTS; TERAHERTZ WAVES;

REACTIVE ION ETCHING;

EID: 80052160373     PISSN: 15571939     EISSN: 15571947     Source Type: Journal    
DOI: 10.1007/s10948-010-0859-9     Document Type: Article

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