High efficiency selective emitter cells using patterned ion implantation

Energy Procedia

Volumn 8, Issue , 2011, Pages 706-711

  Dubé, Christopher E ^a   Tsefrekas, Basil ^a   Buzby, Dean ^b   Tavares, Robert ^b   Zhang, Weiming ^b   Gupta, Atul ^a   Low, Russell J ^a   Skinner, Wesley ^a   Mullin, James ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

^b Heraeus Materials Technology LLC   (United States)

Author keywords

Ion implant; Selective emitter; Silicon solar cell

Indexed keywords

DIFFUSION; EFFICIENCY; IONS; MANUFACTURE; PASSIVATION; SILICON IMPLANTS; SILICON SOLAR CELLS; SOLAR CELLS;

DIFFUSION PROCESS; HIGH-EFFICIENCY CELLS; ION IMPLANT; JUNCTION ISOLATION; OXIDE PASSIVATIONS; SELECTIVE EMITTERS; SURFACE PASSIVATION; SURFACE RECOMBINATIONS;

ION IMPLANTATION;

EID: 80052091908     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.06.205     Document Type: Conference Paper

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8. Low RJ, Gupta A, Dubé CE, Tsefrekas B, Skinner W, Mullin J. to be published.