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Volumn 8, Issue , 2011, Pages 565-570

The origin of background plating

Author keywords

Background plating; Copper; Nickel; Shading; Shunting

Indexed keywords

COPPER; CRYSTALLINE MATERIALS; ION BEAMS; METALLIZING; METALS; NICKEL; SCANNING ELECTRON MICROSCOPY; SCREEN PRINTING; SILICON; SILICON NITRIDE; SILICON SOLAR CELLS; SILVER; THICK FILMS;

EID: 80052083075     PISSN: 18766102     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1016/j.egypro.2011.06.183     Document Type: Conference Paper
Times cited : (18)

References (6)
  • 1
    • 55649122861 scopus 로고    scopus 로고
    • Fineline printed silicon solar cells exceeding 20% efficiency
    • Hörteis M, Glunz SW. Fineline printed silicon solar cells exceeding 20% efficiency. Progr Photovolt Res Appl 2008;16:555- 600.
    • (2008) Progr Photovolt Res Appl , vol.16 , pp. 555-600
    • Hörteis, M.1    Glunz, S.W.2
  • 2
    • 80052099019 scopus 로고    scopus 로고
    • Electroless nickel and copper metallization: Contact formation on crystalline silicon and background plating behavior on PECVD SiNx:H layers
    • Valencia
    • th EU-PVSEC, Valencia 2010, p. 1892-5.
    • (2010) th EU-PVSEC , pp. 1892-1895
    • Braun, S.1    Emre, E.2    Raabe, B.3    Hahn, G.4
  • 4
    • 80052099563 scopus 로고    scopus 로고
    • Relevant pinhole characterisation method for dielectric layers for silicon solar cells
    • Hamburg
    • th EU-PVSEC, Hamburg 2009, p. 2084-7.
    • (2009) th EU-PVSEC , pp. 2084-2087
    • Cast, P.1    Tanay, F.2    Alemán, M.3
  • 6
    • 80052095959 scopus 로고    scopus 로고
    • A new concept to produce a random pyramid texture on monocrystalline silicon at elevated process temperatures and shortened process times
    • Hamburg
    • th EU-PVSEC, Hamburg 2009, p. 1958-1960.
    • (2009) th EU-PVSEC , pp. 1958-1960
    • Ximello, N.1    Haverkamp, H.2    Hahn, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.