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Journal of Vacuum Science and Technology B

Volumn 29, Issue 4, 2011, Pages

Effect of sputtering on ferromagnet-oxide-silicon spin injection contacts

(5) Gundapaneni, Suresh a Ganguly, Swaroop a Van Roy, Willem b,c Kaushal, Sanjeev a Sugishima, Kenji a

a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY (India)

b IMEC (Belgium)

c Tokyo Electron Santa Clara Labs (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; MAGNETORESISTANCE; METALLIC COMPOUNDS; METALS; MOS DEVICES;

CAPACITANCE VOLTAGE MEASUREMENTS; EFFECTIVE WORK FUNCTION; INTERNAL PHOTOEMISSION; METAL OXIDE INTERFACE; METAL OXIDE SEMICONDUCTOR; METAL SEMICONDUCTORS; NEGATIVE CHARGE; SPIN INJECTION AND DETECTIONS;

OXIDE SEMICONDUCTORS;

EID: 80051910049 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3601119 Document Type: Article

Times cited : (3)

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