Synthesis of carbon nanowalls by plasma-enhanced chemical vapor deposition in a CO/H2 microwave discharge system

Diamond and Related Materials

Volumn 20, Issue 8, 2011, Pages 1129-1132

  Mori, Shinsuke ^a   Ueno, Takanori ^a,b   Suzuki, Masaaki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b CANON INC   (Japan)

Author keywords

Carbon monoxide; Carbon nanowalls; Microwave discharge; Plasma enhance CVD; Rapid growth

Indexed keywords

CARBON NANOWALLS; DISCHARGE SYSTEMS; FEED RATIOS; GROWTH AREAS; HIGH GROWTH RATE; MICROWAVE DISCHARGE; PLASMA-ENHANCE CVD; RAPID GROWTH;

CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; MICROWAVES; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ELECTRIC DISCHARGES;

EID: 80051791322     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.06.021     Document Type: Article

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