Effect of fluorine substitution of aniline ring on pulsed plasma polymer growth and structure

Plasma Processes and Polymers

Volumn 8, Issue 8, 2011, Pages 763-772

  Mérian, Tiphaine ^a   Debarnot, Dominique ^a   Poncin Epaillard, Fabienne ^a  

^a UNIVERSITÉ DU MAINE   (France)

Author keywords

fluoroaniline; growth kinetics; plasma polymerization; polymer structure

Indexed keywords

DISCHARGE POWER; DOPING MECHANISM; FLUORINE ATOMS; FLUORINE SUBSTITUTION; FLUOROANILINE; LINEAR POLYMERS; META POSITIONS; PLASMA POLYMERS; POLYMER STRUCTURE; PULSED PLASMA; PULSED PLASMA POLYMERIZATION; QUARTZ CRYSTAL MICROGRAVIMETRY; STRUCTURE OF THE POLYMERS;

ANILINE; CRYSTAL ATOMIC STRUCTURE; ELECTRIC DISCHARGES; FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GROWTH KINETICS; PHOTOELECTRON SPECTROSCOPY; PLASMA POLYMERIZATION; PLASMAS; POLYANILINE; QUARTZ; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMERS;

EID: 80051775504     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000204     Document Type: Article

References (30)

1. H. Yasuda, Plasma Polymerization, Academic Press, New York 1985, p. 432.
2. L. M. Han, R. B. Timmons, D. Bogdal, I. J. Pielichowski, Chem. Mater. 1998, 10, 1422.
3. N. M. Mackie, D. G. Castner, E. R. Fisher, Langmuir 1998, 14, 1227.
4. M. T. Van Os, B. Menges, R. Foerch, G. J. Vancso, W. Knoll, Chem. Mater. 1999, 11, 32257.
5. J. Zhang, X. Feng, H. Xie, Y. Shi, T. Pu, Y. Guo, Thin Solid Films 2003, 435, 108.
6. A. Choukourov, H. Biederman, D. Slavinska, M. Trchova, A. Hollander, Surf. Coat. Technol. 2003, 174-175, 863.
7. M. E. Ryan, A. M. Hynes, J. P. S. Badyal, Chem. Mater. 1996, 8, 37.
8. D. Debarnot, T. Mérian, F. Poncin-Epaillard, Plasma Chem. Plasma Process. 2011, 31, 217.
9. M. G. Olayo, G. J. Cruz, E. Ordonez, J. Morales, R. Olayo, J. Appl. Polym. Sci. 2006, 102, 4682.
10. D. Nicolas-Debarnot, F. Poncin-Epaillard, Anal. Chim. Acta 2003, 475, 1.
11. V. Rouessac, A. van der Lee, F. Bosc, J. Durand, A. Ayral, Microporous Mesoporous Mater. 2008, 111, 417.
12. A. W. Warner, C. D. Stockbridge, in Vacuum Microbalance Technique, Vol. 3, K. H. Behrndt, Ed., Plenum Press, New York 1963, pp. 55-73.
13. N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Lancaster, Technomic 1996, p. 276.
14. R. d'Agostino, D. L. Flamm, J. Appl. Phys. 1981, 52, 162.
15. M. B. Riekerink Olde, J. G. A. Terlingen, G. H. M. Engbers, J. Feijen, Langmuir 1999, 15, 4847.
16. J. P. Booth, Plasma Sources Sci. Technol. 1999, 8, 249.
17. R. d'Agostino, F. Caramarossa, V. Colaprico, R. d'Ettole, J. Appl. Phys. 1983, 54, 1284.
18. E. A. Truesdale, G. Smolinsky, J. Appl. Phys. 1979, 50, 6594.
19. L. M. H. Groenewoud, G. H. M. Engbers, J. G. A. Terlingen, H. Wormeester, J. Feijen, Langmuir 2000, 16, 6278.
20. T. Uchida, K. Senda, G. K. Vinogradov, S. Morita, Thin Solid Films 1996, 281-282, 536.
21. T. Uchida, G. K. Vinogradov, S. Morita, J. Electrochem. Soc. 1997, 144, 1434.
22. C. L. Rinsch, X. Chen, V. Panchalingam, R. C. Eberhart, J.-H. Wang, R. B. Timmons, Langmuir 1996, 12, 2995.
23. L. M. Han, R. B. Timmons, Chem. Mater. 1998, 10, 1422.
24. J. Wang, K. G. Neoh, L. Zhao, E. T. Kang, J. Colloid Interface Sci. 2002, 251, 214.
25. J. C. Chiang, A. G. MacDiarmid, Synth. Met. 1986, 13, 193.
26. J. Wang, Polym. Degrad. Stab. 2005, 89, 15.
27. A. Kruse, A. Baalmann, W. Budden, V. Schlett, M. Hennecke, Surf. Coat. Technol. 1993, 59, 359.
28. X.-R. Zeng, T.-M. Ko, J. Polym. Sci., Part B: Polym. Phys. 1997, 35, 1993.
29. X.-R. Zeng, T.-M. Ko, Polymer 1998, 39, 1187.
30. A. Bhattacharyya, R. Roy, S. K. Sen, S. Sen, A. K. Chakraborty, T. K. Bhattacharyya, Vacuum 1998, 49, 253.