Synthesis and characterization of highly textured Pt-Bi thin films

Philosophical Magazine

Volumn 91, Issue 25, 2011, Pages 3406-3415

  Li, X Z ^a   Kharel, P ^a   Shah, V R ^a   Sellmyer, D J ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

electron diffraction; microstructure; Pt Bi; resistivity; simulation; TEM; texture; thin film; XRD

Indexed keywords

ANNEALING TEMPERATURES; E BEAM EVAPORATION; ELECTRICAL RESISTIVITY; FILM PLANES; PT-BI; SIMULATION; THERMALLY OXIDIZED SILICON; XRD;

ANNEALING; ELECTRIC CONDUCTIVITY; ELECTRON DIFFRACTION; SILICON OXIDES; THIN FILMS; X RAY DIFFRACTION;

PLATINUM;

EID: 80051679389     PISSN: 14786435     EISSN: 14786443     Source Type: Journal    
DOI: 10.1080/14786435.2011.580289     Document Type: Article

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