AFM imaging of adsorbed nafion polymer on mica and graphite at molecular level

Langmuir

Volumn 27, Issue 16, 2011, Pages 10157-10166

  Koestner, Roland ^a   Roiter, Yuri ^b   Kozhinova, Irina ^c   Minko, Sergiy ^b  

^a GENERAL MOTORS CORPORATION   (United States)

^b CLARKSON UNIVERSITY   (United States)

^c Trison Business Solutions   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM IMAGING; CHAIN AGGREGATION; COIL CONFORMATIONS; EQUILIBRIUM CONFORMATION; HIGHLY ORDERED PYROLITIC GRAPHITES; ISO-ELECTRIC POINTS; MODEL SURFACE; MOLECULAR LEVELS; NAFION STRUCTURE; PERFLUOROSULFONIC ACID; PERSISTENCE LENGTH; REPULSIVE ELECTROSTATIC INTERACTIONS; SIDE-CHAINS; SINGLE MOLECULE LEVEL; SURFACE COVERAGES;

ADSORPTION; ATOMIC FORCE MICROSCOPY; DISPERSIONS; GRAPHITE; MICA; SOLVENTS;

CONFORMATIONS;

EID: 80051483345     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la201283a     Document Type: Article

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