Spectroscopic ellipsometry of CVD graphene

ECS Transactions

Volumn 35, Issue 3, 2011, Pages 173-183

  Nelson, F J ^a   Kamineni, V K ^a   Zhang, T ^a   Comfort, E S ^a   Lee, J U ^a   Diebold, A C ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

300-MM SILICON WAFERS; COMPLEX REFRACTIVE INDEX; EFFECTIVE-MEDIUM APPROXIMATION; GLASS SUBSTRATES; IN-LINE METROLOGY; OPTICAL DISPERSION; SINGLE LAYER;

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; GLASS; LIGHT REFRACTION; NANOWIRES; REFRACTIVE INDEX; REFRACTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES;

GRAPHENE;

EID: 79960760556     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3569909     Document Type: Conference Paper

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