New yield-aware mask strategies

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8081, Issue , 2011, Pages

  Jeong, Kwangok ^a   Kahng, Andrew B ^a,b   Progler, Christopher J ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c PHOTRONICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST MODELS; DEFECTIVITY; EUV MASK BLANKS; FLOORPLANS; LARGE SIZES; MASK BLANK; MASK PATTERNS; MULTIPLE LAYERS; PARAMETRIC YIELD; PROCESSING COSTS; SINGLE LAYER;

DEFECTS; PHOTOMASKS;

OPTICAL INSTRUMENTS;

EID: 79960507057     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.899295     Document Type: Conference Paper

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