Highly optimized nanocrystal-based split gate flash for high performance and low power microcontroller applications

2011 3rd IEEE International Memory Workshop, IMW 2011

Volumn , Issue , 2011, Pages

  Yater, Jane ^a   Hong, C ^a   Kang, S T ^a   Kolar, D ^a   Min, B ^a   Shen, J ^a   Chindalore, G ^a   Loiko, K ^a   Winstead, B ^a   Williams, S ^a   Gasquet, H ^a   Suhail, M ^a   Broeker, K ^a   Lepore, E ^a   Hardell, A ^a   Malloch, W ^a   Syzdek, R ^a   Chen, Y ^b   Ju, Y ^b   Kumarasamy, S ^b   Liu, H ^b   Lei, L ^b   Indajang, B ^b   more..

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b GLOBALFOUNDRIES SINGAPORE PTE LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE LOSS; DATA RETENTION; EMBEDDED FLASH; EMBEDDED FLASH MEMORY; LOW-POWER MICROCONTROLLERS; OPERATING WINDOWS; SOURCE-SIDE INJECTION; SPLIT GATES; SPLIT-GATE FLASHES;

DURABILITY; MICROCONTROLLERS; NANOCRYSTALS;

FLASH MEMORY;

EID: 79959999021     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMW.2011.5873213     Document Type: Article

References (6)

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4. J. DeBlauwe et al., IEEE TED, vol. 24, pp. 2466-2474, 1998
5. C. Hong et al., Proc. of IEEE NVSMW, pp. 75-76, 2007
6. P.J. Kuhn et al., Proc. of IEEE IRPS, pp. 266-270, 2001