Femtosecond Z-scan measurement of third-order nonlinear refractive indices of BaMgF4

Applied Physics Letters

Volumn 98, Issue 19, 2011, Pages

  Chen, Junjie ^a   Chen, Xianfeng ^a   Wu, Anhua ^b   Li, Hongjun ^b   Zheng, Yuanlin ^a   Ma, Yanzhi ^a   Jiang, Linwen ^b   Xu, Jun ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC AXES; FEMTO-SECOND LASER; FEMTOSECONDS; NONLINEAR REFRACTIVE INDEX; THIRD-ORDER; THIRD-ORDER NONLINEAR SUSCEPTIBILITY; Z-SCAN MEASUREMENT; Z-SCAN TECHNIQUE;

CRYSTAL GROWTH FROM MELT; LIGHT REFRACTION; PHASE MODULATION; REFRACTOMETERS; SINGLE CRYSTALS;

REFRACTIVE INDEX;

EID: 79959659728     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3587642     Document Type: Article

References (29)

1. C. Chen, Y. Wang, Y. Xia, B. Wu, D. Tang, K. Wu, Z. Wenrong, L. Yu, and L. Mei, J. Appl. Phys. 0021-8979 77, 2268 (1995). 10.1063/1.358814
2. C. T. Chen, J. H. Lu, T. Togashi, T. Suganuma, T. Sekikawa, S. Watanabe, Z. Y. Xu, and J. Y. Wang, Opt. Lett. 0146-9592 27, 637 (2002). 10.1364/OL.27.000637
3. C. Chen, Z. Lin, and Z. Wang, Appl. Phys. B: Lasers Opt. 0946-2171 80, 1 (2005). 10.1007/s00340-004-1645-9 (Pubitemid 40003029)
4. C. Chen, Opt. Mater. 0925-3467 26, 425 (2004). 10.1016/j.optmat.2004.02. 007
5. E. G. Víllora, K. Shimamura, K. Sumiya, and H. Ishibashi, Opt. Express 1094-4087 17, 12362 (2009). 10.1364/OE.17.012362
6. K. Shimamura, E. G. Villora, H. R. Zeng, M. Nakamura, S. Takekawa, and K. Kitamura, Appl. Phys. Lett. 0003-6951 89, 232911 (2006). 10.1063/1.2403917 (Pubitemid 44907278)
7. C. V. Kannan, K. Shimamura, H. R. Zeng, H. Kimura, E. G. Villora, and K. Kitamura, J. Appl. Phys. 0021-8979 104, 114113 (2008). 10.1063/1.3032739
8. H. R. Zeng, K. Shimamura, C. V. Kannan, E. A. G. Villora, S. Takekawa, and K. Kitamura, Appl. Phys. A: Mater. Sci. Process. 0947-8396 85, 173 (2006). 10.1007/s00339-006-3682-1 (Pubitemid 44394590)
9. H. R. Zeng, K. Shimamura, E. G. Villora, S. Takekawa, and K. Kitamura, J. Appl. Phys. 0021-8979 101, 074109 (2007). 10.1063/1.2645955 (Pubitemid 46610131)
10. S. C. Buchter, T. Y. Fan, V. Liberman, J. J. Zayhowski, M. Rothschild, E. J. Mason, A. Cassanho, H. P. Jenssen, and J. H. Burnett, Opt. Lett. 0146-9592 26, 1693 (2001). 10.1364/OL.26.001693
11. J. A. Armstrong, N. Bloembergen, J. Ducuing, and P. S. Pershan, Phys. Rev. 0031-899X 127, 1918 (1962). 10.1103/PhysRev.127.1918
12. P. S. Bechthold and S. Haussuhl, Appl. Phys. (Berlin) 0340-3793 14, 403 (1977). 10.1007/BF00883447
13. M. Sheik-Bahae, A. A. Said, T. H. Wei, D. J. Hagan, and E. W. Van Stryland, IEEE J. Quantum Electron. 0018-9197 26, 760 (1990). 10.1109/3.53394 (Pubitemid 20714175)
14. R. DeSalvo, A. A. Said, D. J. Hagan, E. W. Van Stryland, and M. Sheik-Bahae, IEEE J. Quantum Electron. 0018-9197 32, 1324 (1996). 10.1109/3.511545
15. R. DeSalvo, M. Sheik-Bahae, A. A. Said, D. J. Hagan, and E. W. Van Stryland, Opt. Lett. 0146-9592 18, 194 (1993). 10.1364/OL.18.000194
16. M. Sheik-Bahae and M. Ebrahimzadeh, Opt. Commun. 0030-4018 142, 294 (1997). 10.1016/S0030-4018(97)00303-9
17. K. Recker, F. Wallrafen, and S. Haussuhl, J. Cryst. Growth 0022-0248 26, 97 (1974). 10.1016/0022-0248(74)90206-1
18. P. P. Ho and R. R. Alfano, Phys. Rev. A 1050-2947 20, 2170 (1979). 10.1103/PhysRevA.20.2170
19. G. Yang, W. T. Wang, L. Yan, H. B. Lu, G. Z. Yang, and Z. H. Chen, Opt. Commun. 0030-4018 209, 445 (2002). 10.1016/S0030-4018(02)01676-0 (Pubitemid 34862338)
20. R. DeSalvo, D. J. Hagan, M. Sheik-Bahae, G. Stegeman, E. W. Van Stryland, and H. Vanherzeele, Opt. Lett. 0146-9592 17, 28 (1992). 10.1364/OL.17.000028
21. M. Eibschutz, H. J. Guggenheim, S. H. Wemple, I. Camlibel, and M. DiDomenico, Jr., Phys. Lett. A 0375-9601 29, 409 (1969). 10.1016/0375-9601(69) 90332-6
22. F. Gingl, Z. Anorg. Allg. Chem. 0044-2313 623, 705 (1997). 10.1002/zaac.199762301112
23. J. N. B. Reddy, S. Elizabeth, H. L. Bhat, N. Venkatram, and D. N. Rao, Opt. Mater. 0925-3467 31, 1022 (2009). 10.1016/j.optmat.2008.11.013
24. V. P. Kandidov, O. G. Kosareva, I. S. Golubtsov, W. Liu, A. Becker, N. Akozbek, C. M. Bowden, and S. L. Chin, Appl. Phys. B: Lasers Opt. 0946-2171 77, 149 (2003). 10.1007/s00340-003-1214-7
25. G. D. Boyd and D. A. Kleinman, J. Appl. Phys. 0021-8979 39, 3597 (1968). 10.1063/1.1656831
26. C. M. Qiao and M. S. Yoo, J. High Speed Network 8, 69 (1999).
27. G. I. Papadimitriou, C. Papazoglou, and A. S. Pomportsis, J. Lightwave Technol. 0733-8724 21, 384 (2003). 10.1109/JLT.2003.808766
28. X. Q. Yan, Z. B. Liu, X. L. Zhang, W. Y. Zhou, and J. G. Tian, Opt. Express 1094-4087 17, 6397 (2009). 10.1364/OE.17.006397
29. H. B. Liao, R. F. Xiao, H. Wang, K. S. Wong, and G. K. L. Wong, Appl. Phys. Lett. 0003-6951 72, 1817 (1998). 10.1063/1.121193 (Pubitemid 128671469)