Parallel processing for pitch splitting decomposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Barnes, Levi ^a   Li, Yong ^a   Wadkins, David ^a   Biederman, Steve ^a   Miloslavsky, Alex ^a   Cork, Chris ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOUBLE PATTERNING; GEOMETRIC DISTRIBUTION; GLOBAL PROBLEMS; INPUT PATTERNS; LARGE PARTS; ORDERS OF MAGNITUDE; PARALLEL PROCESSING; RUNTIMES;

PROBABILITY DISTRIBUTIONS; PROGRAM PROCESSORS;

PHOTOMASKS;

EID: 79959357762     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.831396     Document Type: Conference Paper

References (4)

1. rd International Symposium on Immersion Lithography, Kyoto (2006).
2. Wiaux, V., Verhaegen, S., Cheng, S., Iwamoto, F., Jaenen, P., Maenhoudt, M., Matsuda, T., Postnikov, S. and Vandenberghe, G., "Split and Design Guidelines for Double Patterning," Proc. SPIE 6924, 692409 (2008).
3. Mukai, H., Kobayashi, Y., Yamaguchi, S., Kawano, K. and Hashimoto, K., "A Study of Mask Specification in Spacer Patterning Technology," Proc. SPIE 7028, 702812 (2008).
4. Drapeau M. et. al., Patterning design split implementation and validation for the 32nm Node. Proc. SPIE Vol. 6521, (2007)