Spacer defined double patterning for (sub-)20nm half pitch single damascene structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7973, Issue , 2011, Pages

  Versluijs, Janko ^a   Siew, Yong Kong ^a   Kunnen, Eddy ^a   Vangoidsenhoven, Diziana ^a   Demuynck, Steven ^a   Wiaux, Vincent ^a   Dekkers, Harold ^a   Beyer, Gerald ^a  

^a IMEC   (Belgium)

Author keywords

Alignment; Double patterning; Lwr ler; Single damascene; Spacer

Indexed keywords

BACK END OF LINES; DOUBLE PATTERNING; IMMERSION LITHOGRAPHY; LINE EDGE ROUGHNESS; LWR/LER; ON-WAFER; SINGLE DAMASCENE; SINGLE DAMASCENE STRUCTURES; SPACER; TEST STRUCTURE;

EXTREME ULTRAVIOLET LITHOGRAPHY; ROUGHNESS MEASUREMENT;

LITHOGRAPHY;

EID: 79959266892     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.881600     Document Type: Conference Paper

References (7)

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3. C. Bencher et al., Proc SPIE 6924-4E (2008).
4. Y.K. Siew et al., IITC (2010).
5. D. Laidler et al., Proc SPIE6922-1E (2008).
6. S. Demuynck et al., IITC (2010).
7. Y.K. Siew et al., IITC(2011), submitted.