Electron beam deposition system causing little damage to organic layers

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6219-6223

  Yamada, Minoru ^a,b   Matsumura, Michio ^a   Maeda, Yasuhiro ^b  

^a OSAKA UNIVERSITY   (Japan)

^b HITACHI ZOSEN CORPORATION   (Japan)

Author keywords

Aluminum deposition; Electroluminescence; Electron beam deposition; Organic light emitting diodes; Organic semiconductor; Surface damage; X ray intensity

Indexed keywords

ALUMINUM DEPOSITION; ELECTRON BEAM DEPOSITIONS; ORGANIC LIGHT-EMITTING; ORGANIC SEMICONDUCTOR; SURFACE DAMAGE; X RAY INTENSITY;

ALUMINUM; CHEMICAL MODIFICATION; DEPOSITION; DEPOSITION RATES; ELECTRODES; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; LIGHT; LIGHT EMISSION; ORGANIC LIGHT EMITTING DIODES (OLED); SINTERING; X RAYS;

ALUMINUM COATINGS;

EID: 79958223014     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.03.056     Document Type: Article

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