Silicon oxysulfide, OSiS: Rotational spectrum, quantum-chemical calculations, and equilibrium structure

Journal of Physical Chemistry Letters

Volumn 2, Issue 11, 2011, Pages 1228-1231

  Thorwirth, Sven ^a   MÜck, Leonie Anna ^b   Gauss, Jürgen ^b   Tamassia, Filippo ^c   Lattanzi, Valerio ^d,e   McCarthy, Michael C ^d,e  

^a UNIVERSITY OF COLOGNE   (Germany)

^b JOHANNES GUTENBERG UNIVERSITY   (Germany)

^c UNIVERSITY OF BOLOGNA   (Italy)

^d HARVARD SMITHSONIAN CENTER FOR ASTROPHYSICS   (United States)

^e HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVITY; BOND DISTANCE; COUPLED CLUSTER TECHNIQUES; ELECTROSTATIC EFFECT; EQUILIBRIUM STRUCTURES; EXPERIMENTAL DATA; EXTRAPOLATION SCHEMES; FOURIER TRANSFORM MICROWAVE SPECTROSCOPY; GASPHASE; HIGH SPECTRAL RESOLUTION; ISOTOPIC SPECIES; KEY FACTORS; MULTIPLE BONDING; NATURAL POPULATION ANALYSIS; PARTIAL CHARGES; QUANTUM CHEMICAL CALCULATIONS; QUANTUM-CHEMICAL CALCULATION; ROTATIONAL SPECTRA; SPECTROSCOPIC INFORMATION; STRUCTURAL PARAMETER; TRIATOMIC MOLECULES; VIBRATION-ROTATION INTERACTIONS;

EQUILIBRIUM CONSTANTS; FOURIER TRANSFORMS; MICROWAVE SPECTROSCOPY; QUANTUM CHEMISTRY; SILICON COMPOUNDS;

SILICON OXIDES;

EID: 79958213132     PISSN: None     EISSN: 19487185     Source Type: Journal    
DOI: 10.1021/jz200368x     Document Type: Article

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