Self-assembled monolayer of ammonium pyrrolidine dithiocarbamate on copper detected using electrochemical methods, surface enhanced Raman scattering and quantum chemistry calculations

Thin Solid Films

Volumn 519, Issue 19, 2011, Pages 6492-6498

  Liao, Q Q ^a   Yue, Z W ^a   Yang, D ^a   Wang, Z H ^c   Li, Z H ^b   Ge, H H ^a   Li, Y J ^c  

^a SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

^b FUDAN UNIVERSITY   (China)

^c TONGJI UNIVERSITY   (China)

Author keywords

Ammonium pyrrolidine dithiocarbamate; Copper; Corrosion inhibition; Quantum chemistry; Self assembled monolayer

Indexed keywords

AMMONIUM PYRROLIDINEDI THIOCARBAMATE; COPPER SURFACE; CORROSION INHIBITION; ELECTROCHEMICAL METHODS; HIGHEST OCCUPIED MOLECULAR ORBITAL; HYDROCHLORIC ACID SOLUTION; INHIBITION EFFICIENCY; LOWEST UNOCCUPIED MOLECULAR ORBITAL; NEGATIVE CHARGE; OXIDATION-REDUCTION CYCLE; PERPENDICULAR ORIENTATION; POTASSIUM CHLORIDE SOLUTIONS; QUANTUM CHEMICAL CALCULATIONS; QUANTUM CHEMISTRY CALCULATIONS; SAM FORMATION; SELF-ASSEMBLED; SULFUR ATOMS; SURFACE ENHANCED RAMAN SCATTERING; SURFACE-ENHANCED RAMAN SCATTERING SPECTROSCOPY;

AMMONIUM COMPOUNDS; ATOMIC SPECTROSCOPY; CHEMISORPTION; CHLORINE COMPOUNDS; CORROSION PREVENTION; HYDROCHLORIC ACID; MOLECULAR MODELING; MOLECULAR ORBITALS; POTASSIUM; QUANTUM THEORY; RAMAN SCATTERING; SELF ASSEMBLED MONOLAYERS; SULFUR;

COPPER;

EID: 79958190826     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.04.240     Document Type: Article

References (38)

1. D.J. Bradshaw, and C.T. O'Connor Miner. Eng. 7 1994 681
2. R. Say, E. Birlik, A. Denizli, and A. Ersöz Appl. Clay Sci. 31 2006 298
3. C.H. Lee, S.H. Kim, and S.M. Lee Eur. J. Pharmacol. 595 2008 100
4. Lj. Aljinović, J. Radosević, M. Šmith, and M. Kliskić Oebalia 19 1993 567
5. Lj. Aljinović, M. Šmith, V. Gotovac, and Z. Hell 1990 1091
6. Lj. Aljinović, S. Gudić, and M. Šmith J. Appl. Electrochem 30 2000 973
7. A.E. Al-Rawajfeh, and E.M. Al-Shamaileh Desalination 206 2007 169
8. E. Almirall, A. Fragoso, and R. Cao Electrochem. Commun. 1 1999 10
9. M.G. Li, F. Gao, P. Yang, L. Wang, and B. Fang Surf. Sci. 602 2008 151
10. M. Fleischmann, P.J. Hendrz, and A.J. McQuillan Chem. Phys. Lett. 26 1974 163
11. M.J. Frisch, G.W. Trucks, H.B. Schlegel, G.E. Scuseria, M.A. Robb, J.R. Cheeseman, J.A. Montgomery Jr., T. Vreven, K.N. Kudin, J.C. Burant, J.M. Millam, S.S. Iyengar, J. Tomasi, V. Barone, B. Mennucci, M. Cossi, G. Scalmani, N. Rega, G.A. Petersson, H. Nakatsuji, M. Hada, M. Ehara, K. Toyota, R. Fukuda, J. Hasegawa, M. Ishida, T. Nakajima, Y. Honda, O. Kitao, H. Nakai, M. Klene, X. Li, J.E. Knox, H.P. Hratchian, J.B. Cross, C. Adamo, J. Jaramillo, R. Gomperts, R.E. Stratmann, O. Yazyev, A.J. Austin, R. Cammi, C. Pomelli, J.W. Ochterski, P.Y. Ayala, K. Morokuma, G.A. Voth, P. Salvador, J.J. Dannenberg, V.G. Zakrzewski, S. Dapprich, A.D. Daniels, M.C. Strain, O. Farkas, D.K. Malick, A.D. Rabuck, K. Raghavachari, J.B. Foresman, J.V. Ortiz, Q. Cui, A.G. Baboul, S. Clifford, J. Cioslowski, B.B. Stefanov, G. Liu, A. Liashenko, P. Piskorz, I. Komaromi, R.L. Martin, D.J. Fox, T. Keith, M.A. Al-Laham, C.Y. Peng, A. Nanayakkara, M. Challacombe, P.M.W. Gill, B. Johnson, W. Chen, M.W. Wong, C. Gonzalez, and J.A. Pople Gaussian 03, Revision B.05 2003 Gaussian, Inc Pittsburgh, PA
12. P.J. Stephens, F.J. Devlin, C.F. Chabalowski, and M.J. Frisch J. Phys. Chem. 11623 98 1994
13. J. Junquera, O. Paz, D. Sanchez-Portal, and E. Artacho Phys. Rev. B 64 2001 235111
14. N. Troullier, and J.L. Martins Phys. Rev. B 43 1991 1993
15. J.P. Perdew, K. Burke, and M. Ernzerhof Phys. Rev. Lett. 77 1996 3865
16. D.G. Li, S.H. Chen, S.Y. Zhao, and H.Y. Ma Colloids Surf. A 273 2006 16
17. K.F. Khaled, and N. Hackerman Electrochim. Acta 49 2004 485
18. A.V. Benedetti, P.T.A. Sumodjo, K. Nobe, P.L. Cabot, and W.G. Proud Electrochim. Acta 40 1995 2657
19. M.G. Hosseini, S.F.L. Mertens, M. Ghorbani, and M.R. Arshadi Mater. Chem. Phys. 78 2003 800
20. H.G. Hong, and W. Park Electrochim. Acta 51 2005 579
21. F. Bentiss, M. Lebrini, and M. Lagrenée Corros. Sci. 47 2005 2915
22. R.F.V. Villamil, P. Corio, J.C. Rubim, and S.M.L. Agostinho J. Electroanal. Chem. 535 2002 75
23. C. Küstü, K.C. Emregül, and O. Atakol Corros. Sci. 49 2007 2800
24. F. Bentiss, C. Jama, B. Mernari, H.E. Attari, L.E. Kadi, M. Lebrini, M. Traisnel, and M. Lagrenée Corros. Sci. 51 2009 1628
25. K.F. Khaled Appl. Surf. Sci. 252 2006 4120
26. H.F. Finely, and N. Hackerman J. Electrochem. Soc. 107 1960 259
27. K.F. Khaled Mater. Chem. Phys. 112 2008 104
28. H.P. Hack, and H.W. Pickering J. Electrochem. Soc. 138 1991 690
29. A. Kornherr, S. Hansal, W.E.G. Hansal, J.O. Besenhard, H. Kronberger, G.E. Nauer, and G. Zifferer J. Chem. Phys. 119 2003 9719
30. J. Sarker, J. Chowdhury, M. Ghosh, R. De, and G.B. Talapatra J. Phys. Chem. B 109 2005 12861
31. G.A. Hope, K. Walting, and R. Woods Colloids Surf. A 178 2001 157
32. B. Pergolese, M. Muniz-Miranda, and A. Bigotto J. Phys. Chem. B 110 2006 9241
33. B. Pergolese, M. Muniz-Miranda, and A. Bigotto J. Mol. Struct. 924-926 2009 559
34. K. Nakamoto, J. Fujita, R.A. Condrate, and Y. Morimoto J. Chem. Phys. 39 1963 423
35. J.H. Ji, H.F. Yang, X.L. Ma, Y.P. Sun, X. Zhu, W. Song, and G.P. Duan Acta Chim. Sinica 66 2008 1333
36. T.M. El-Gogary, and M.S. Soliman Spectrochim. Acta A 57 2001 2647
37. H.F. Yang, J. Feng, Y.L. Liu, Y. Yang, Z.R. Zhang, G.L. Shen, and R.Q. Yu J. Phys. Chem. B 108 2004 17412
38. M. Moskovitz, and J.S. Suh J. Phys. Chem. 88 1984 5526