Synthesis of SiO2-SnO2 gels in water free conditions

Journal of Porous Materials

Volumn 18, Issue 2, 2011, Pages 241-249

  Kirszensztejn, Piotr ^a   Kawałko, Adriana ^a   Tolińska, Agnieszka ^a   Przekop, Robert ^a  

^a ADAM MICKIEWICZ UNIVERSITY   (Poland)

Author keywords

FTIR; SiO2 SnO2; TA; Texture; XRD

Indexed keywords

DRYING CONTROL CHEMICAL ADDITIVES; FT-IR SPECTRUM; FTIR; LOW-TEMPERATURE NITROGEN; MESO-PORES; MOLAR RATIO; SILICON ATOMS; SIO2-SNO2; SOL-GEL TECHNIQUE; STRETCHING VIBRATIONS; SURFACE AREA; TETRA-ETHYL-ORTHO-SILICATE; XRD;

ATOMIC SPECTROSCOPY; CRYSTAL ATOMIC STRUCTURE; DRYING; GAS ADSORPTION; GELS; SILICON; SILICON COMPOUNDS; STRETCHING; THERMOANALYSIS; TIN;

SILICON OXIDES;

EID: 79958084618     PISSN: 13802224     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10934-010-9376-2     Document Type: Article

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