SEM image modeling using the modular Monte Carlo model MCSEM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7638, Issue , 2010, Pages

  Johnsen, K P ^a   Frase, C G ^a   Bosse, H ^a   Gnieser, D ^b  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

electron raytracing; MCSEM; Monte Carlo method; photomask; Scanning electron microscopy

Indexed keywords

BACKSCATTERED ELECTRONS; DETECTION PROCESS; ELECTROMAGNETIC FIELD SOLVER; ELECTRON PROBE; GERMANY; LAYOUT STRUCTURE; MCSEM; MODULAR PROGRAMS; MONTE CARLO; MONTE CARLO MODEL; MONTE CARLO SIMULATION; PHYSICAL MODEL; PHYSIKALISCH-TECHNISCHE BUNDESANSTALT; PROBE-SAMPLE INTERACTIONS; SCANNING ELECTRON MICROSCOPY IMAGE; SCANNING ELECTRONS; SECONDARY ELECTRONS; SEM IMAGE; SIMULATION RESULT; SOLID-STATE MATERIALS;

DETECTORS; ELECTROMAGNETIC FIELDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; MODELS; MONTE CARLO METHODS; PHOTOMASKS; PROBES; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; UNITS OF MEASUREMENT;

THREE DIMENSIONAL;

EID: 79958032093     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846543     Document Type: Conference Paper

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