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Volumn 323, Issue 1, 2011, Pages 17-20
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X-ray diffraction analysis of step-graded InxGa1-xAs buffer layers grown by molecular beam epitaxy
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Author keywords
High resolution X ray diffraction; InGaAs buffer; Molecular beam epitaxy; Reciprocal space mapping
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Indexed keywords
CRYSTAL QUALITIES;
CRYSTALLINE QUALITY;
DIFFRACTION PEAKS;
GAAS;
GROWTH METHOD;
HIGH RESOLUTION X RAY DIFFRACTION;
IN-SITU ANNEALING;
INGAAS BUFFER;
LATERAL CORRELATION LENGTH;
LATERAL DIRECTIONS;
LOW TEMPERATURES;
QUALITY IMPROVEMENT;
RECIPROCAL SPACE MAPPING;
TEM;
BUFFER LAYERS;
DIFFRACTION;
EPITAXIAL GROWTH;
GALLIUM;
MOLECULAR BEAM EPITAXY;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
X RAYS;
MOLECULAR BEAMS;
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EID: 79957972534
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2010.11.173 Document Type: Article |
Times cited : (17)
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References (6)
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