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Volumn 323, Issue 1, 2011, Pages 17-20

X-ray diffraction analysis of step-graded InxGa1-xAs buffer layers grown by molecular beam epitaxy

Author keywords

High resolution X ray diffraction; InGaAs buffer; Molecular beam epitaxy; Reciprocal space mapping

Indexed keywords

CRYSTAL QUALITIES; CRYSTALLINE QUALITY; DIFFRACTION PEAKS; GAAS; GROWTH METHOD; HIGH RESOLUTION X RAY DIFFRACTION; IN-SITU ANNEALING; INGAAS BUFFER; LATERAL CORRELATION LENGTH; LATERAL DIRECTIONS; LOW TEMPERATURES; QUALITY IMPROVEMENT; RECIPROCAL SPACE MAPPING; TEM;

EID: 79957972534     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.11.173     Document Type: Article
Times cited : (17)

References (6)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.