Tungsten-titanium as advanced material for RF-MEMS switches

Advanced Microsystems for Automotive Applications 2008

Volumn , Issue , 2008, Pages 181-189

  Klein, S ^a   Seidel, H ^a   Schmid, U ^a   Ziegler, V ^b   Prechtel, U ^b   Wurtz A ^c  

^a SAARLAND UNIVERSITY   (Germany)

^b AIRBUS GROUP INNOVATIONS   (Germany)

^c Atmel Germany GmbH   (Germany)

Author keywords

Annealing behaviour; Curvature; RF MEMS; Stress; Tungsten titanium

Indexed keywords

ANNEALING TEMPERATURES; APPLICATION SCENARIO; CURVATURE; DEPOSITION TECHNIQUE; OUT-OF-PLANE DEFLECTION; RF-MEMS; TEMPERATURE STABILITY; TUNGSTEN-TITANIUM;

AUTOMOBILES; ELECTRIC SWITCHES; MICROSYSTEMS; NANOCANTILEVERS; STRESSES; TITANIUM; WET ETCHING;

TUNGSTEN;

EID: 79957940650     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1007/978-3-540-77980-3     Document Type: Conference Paper

References (5)

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