-
1
-
-
0037436499
-
-
J. Wang, J.B. Neaton, H. Zeng, V. Nagarajan, S.B. Ogale, B. Liu, D. Viehland, V. Vaithyanathan, D.G. Schlom, U.V. Waghmare, N.A. Spaldin, K.M. Rabe, M. Wuttig, and R. Ramesh Science 299 2003 1719
-
(2003)
Science
, vol.299
, pp. 1719
-
-
Wang, J.1
Neaton, J.B.2
Zeng, H.3
Nagarajan, V.4
Ogale, S.B.5
Liu, B.6
Viehland, D.7
Vaithyanathan, V.8
Schlom, D.G.9
Waghmare, U.V.10
Spaldin, N.A.11
Rabe, K.M.12
Wuttig, M.13
Ramesh, R.14
-
2
-
-
2642584216
-
-
N. Hur, S. Park, P.A. Sharma, J.S. Ahn, S. Guha, and S.W. Cheong Nature 429 2004 392
-
(2004)
Nature
, vol.429
, pp. 392
-
-
Hur, N.1
Park, S.2
Sharma, P.A.3
Ahn, J.S.4
Guha, S.5
Cheong, S.W.6
-
5
-
-
0026172378
-
-
A.S. Poghossian, H.V. Abovian, P.B. Avakian, S.H. Mkrtchian, and V.M. Haroutunian Sens. Actuators B 4 1991 545
-
(1991)
Sens. Actuators B
, vol.4
, pp. 545
-
-
Poghossian, A.S.1
Abovian, H.V.2
Avakian, P.B.3
Mkrtchian, S.H.4
Haroutunian, V.M.5
-
8
-
-
41649119954
-
-
A.K. Singh, S.D. Kaushik, B. Kumar, P.K. Mishra, A. Venimadhav, V. Siruguri, and S. Patnaik Appl. Phys. Lett. 92 2008 132910
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 132910
-
-
Singh, A.K.1
Kaushik, S.D.2
Kumar, B.3
Mishra, P.K.4
Venimadhav, A.5
Siruguri, V.6
Patnaik, S.7
-
10
-
-
20744435316
-
-
T. Park, G.C. Papaefthymiou, A.R. Moodenbaugh, Y. Mao, and S.S. Wong J. Mater. Chem. 15 2005 2099
-
(2005)
J. Mater. Chem.
, vol.15
, pp. 2099
-
-
Park, T.1
Papaefthymiou, G.C.2
Moodenbaugh, A.R.3
Mao, Y.4
Wong, S.S.5
-
11
-
-
33748535100
-
-
Z. Yang, Y. Huang, B. Dong, H.L. Li, and S.Q. Shi J. Solid State Chem. 179 2006 3324
-
(2006)
J. Solid State Chem.
, vol.179
, pp. 3324
-
-
Yang, Z.1
Huang, Y.2
Dong, B.3
Li, H.L.4
Shi, S.Q.5
-
12
-
-
3342921952
-
-
Y. Xiong, M. Wu, Z. Peng, N. Jiang, and Q. Chen Chem. Lett. 33 2004 502
-
(2004)
Chem. Lett.
, vol.33
, pp. 502
-
-
Xiong, Y.1
Wu, M.2
Peng, Z.3
Jiang, N.4
Chen, Q.5
-
13
-
-
33748313386
-
-
J.T. Han, Y.H. Huang, X.J. Wu, C.L. Wu, W. Wei, B. Peng, W. Huang, and J.B. Goodenough Adv. Mater. 18 2006 2145
-
(2006)
Adv. Mater.
, vol.18
, pp. 2145
-
-
Han, J.T.1
Huang, Y.H.2
Wu, X.J.3
Wu, C.L.4
Wei, W.5
Peng, B.6
Huang, W.7
Goodenough, J.B.8
-
14
-
-
33947102586
-
-
J.T. Han, Y.H. Huang, R.J. Jia, G.C. Shan, R.Q. Guo, and W. Huang J. Cryst. Growth 294 2006 469
-
(2006)
J. Cryst. Growth
, vol.294
, pp. 469
-
-
Han, J.T.1
Huang, Y.H.2
Jia, R.J.3
Shan, G.C.4
Guo, R.Q.5
Huang, W.6
-
15
-
-
34548726252
-
-
X.Y. Zhang, L. Bourgeois, J.F. Yao, H.T. Wang, and P.A. Webley Small 3 2007 1523
-
(2007)
Small
, vol.3
, pp. 1523
-
-
Zhang, X.Y.1
Bourgeois, L.2
Yao, J.F.3
Wang, H.T.4
Webley, P.A.5
-
16
-
-
55949096252
-
-
Y.G. Wang, G. Xu, L.L. Yang, Z.H. Ren, X. Wei, W.J. Weng, P.Y. Du, G. Shen, and G.R. Han Ceram. Int. 35 2009 51
-
(2009)
Ceram. Int.
, vol.35
, pp. 51
-
-
Wang, Y.G.1
Xu, G.2
Yang, L.L.3
Ren, Z.H.4
Wei, X.5
Weng, W.J.6
Du, P.Y.7
Shen, G.8
Han, G.R.9
-
19
-
-
0001555971
-
-
J. Fransaer, J.R. Roos, L. Delaey, O. Van Der Biest, O. Arkens, and J.P. Celis J. Appl. Phys. 65 1989 3277
-
(1989)
J. Appl. Phys.
, vol.65
, pp. 3277
-
-
Fransaer, J.1
Roos, J.R.2
Delaey, L.3
Van Der Biest, O.4
Arkens, O.5
Celis, J.P.6
-
21
-
-
0036538808
-
-
Y.B. Xu, Y.Y. He, X.M. Chen, X.B. Zhang, and L.B. Wang J. Mater. Sci. - Mater. Electron. 13 2002 197
-
(2002)
J. Mater. Sci. - Mater. Electron.
, vol.13
, pp. 197
-
-
Xu, Y.B.1
He, Y.Y.2
Chen, X.M.3
Zhang, X.B.4
Wang, L.B.5
-
30
-
-
14544274594
-
-
P. Duran, J. Tartaj, F. Rubio, C. Moure, and O. Pena Ceram. Int. 31 2005 599
-
(2005)
Ceram. Int.
, vol.31
, pp. 599
-
-
Duran, P.1
Tartaj, J.2
Rubio, F.3
Moure, C.4
Pena, O.5
-
31
-
-
34047136783
-
-
T.-J. Park, G.C. Papaefthymiou, A.J. Viescas, A.R. Moodenbaugh, and S.S. Wong Nano Lett. 7 2007 766
-
(2007)
Nano Lett.
, vol.7
, pp. 766
-
-
Park, T.-J.1
Papaefthymiou, G.C.2
Viescas, A.J.3
Moodenbaugh, A.R.4
Wong, S.S.5
-
33
-
-
56749165888
-
-
C.M. Cho, J.H. Noh, I.-S. Cho, J.-S. An, K.S. Hong, and J.Y. Kim J. Am. Ceram. Soc. 91 2008 3753
-
(2008)
J. Am. Ceram. Soc.
, vol.91
, pp. 3753
-
-
Cho, C.M.1
Noh, J.H.2
Cho, I.-S.3
An, J.-S.4
Hong, K.S.5
Kim, J.Y.6
-
34
-
-
78649286653
-
-
Y.H. Gu, Y. Wang, F. Chen, H.L.W. Chan, and W.P. Chen J. Appl. Phys. 108 2010 094112
-
(2010)
J. Appl. Phys.
, vol.108
, pp. 094112
-
-
Gu, Y.H.1
Wang, Y.2
Chen, F.3
Chan, H.L.W.4
Chen, W.P.5
|