Structural and reactive kinetics in gas-liquid interfacial plasmas

Plasma Sources Science and Technology

Volumn 20, Issue 3, 2011, Pages

  Kaneko, T ^a,b   Chen, Q ^a   Harada, T ^a   Hatakeyama, R ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROCESS; DENSITY STRUCTURES; DISCHARGE KINETICS; DISCHARGE PLASMA; DYNAMIC BEHAVIORS; ELECTROSTATIC POTENTIALS; GAS LIQUIDS; GAS PRESSURES; GASPHASE; INTERFACE REACTIONS; LOW PRESSURES; PLASMA IRRADIATIONS; PLASMA-LIQUID INTERFACES; REACTIVE KINETICS;

CARBON NANOTUBES; ELECTRIC DISCHARGES; ELECTRIC FIELDS; GASES; IONIC LIQUIDS; KINETICS; PLASMAS;

PHASE INTERFACES;

EID: 79957703228     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/3/034014     Document Type: Article

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