Role of complexing ligands in trivalent chromium electrodeposition

Surface and Coatings Technology

Volumn 205, Issue 20, 2011, Pages 4771-4775

  Zeng, Zhixiang ^a   Zhang, Yingxin ^a   Zhao, Wenjie ^a   Zhang, Junyan ^b  

^a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING   (China)

^b LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

Complexing ligand; Electroreduction; Geometric structure; Trivalent chromium

Indexed keywords

COMPLEXING LIGAND; CR COMPLEXES; DEHYDRATION RATES; ELECTROCHEMICAL REDUCTIONS; ELECTROPLATING PROCESS; ELECTROREDUCTION; GENERAL GRADIENT APPROXIMATION; GEOMETRIC STRUCTURE; LIGAND COMPLEXES; TRIVALENT CHROMIUM;

AMINO ACIDS; CHROMATE COATINGS; CHROMIUM; COMPLEXATION; DENSITY FUNCTIONAL THEORY; DEPOSITION RATES; ELECTRODEPOSITION; ELECTROLYTES; ELECTROLYTIC REDUCTION; GEOMETRY; IONS; LIGANDS; LUMINANCE;

CHROMIUM COMPOUNDS;

EID: 79957643180     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.04.019     Document Type: Article

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