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Volumn 190, Issue 1, 2011, Pages 53-59

Importance of pore structure control in porous substrate for high oxygen penetration in La0.6Sr0.4Ti0.3Fe 0.7O3 thin film for CH4 partial oxidation

(5) Kawahara, Akihiro a,b Takahashi, Yousuke b Hirano, Yuji b Hirano, Masayoshi c Ishihara, Tatsumi a

a KYUSHU UNIVERSITY (Japan)

b Noritake Co Limited (Japan)

c CHUBU ELECTRIC POWER CO INC (Japan)

Author keywords

Mixed conductor; Oxygen permeation; Support pore structure

Indexed keywords

FICK'S DIFFUSION; GAS DIFFUSION; GASPHASE; LASER MANUFACTURING; MIXED-CONDUCTOR; OXYGEN PARTIAL PRESSURE; OXYGEN PENETRATION; OXYGEN PERMEATION; PARTIAL OXIDATIONS; PERMEATION RATE; POROUS SUBSTRATES; STRAIGHT PORES; STRUCTURE CONTROL;

COMPUTER SIMULATION; DIFFUSION IN GASES; FILM PREPARATION; FILM THICKNESS; GALLIUM; GALLIUM ALLOYS; LANTHANUM; OXIDATION; OXYGEN; OXYGEN PERMEABLE MEMBRANES; PERMEATION; PORE STRUCTURE;

SUBSTRATES;

EID: 79956114939 PISSN: 01672738 EISSN: None Source Type: Journal
DOI: 10.1016/j.ssi.2010.12.015 Document Type: Article

Times cited : (10)

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