Preparation of sol-gel ZrO2-SiO2 highly reflective multilayer films and laser-induced damage threshold characteristic

Optik

Volumn 122, Issue 13, 2011, Pages 1140-1142

  Guo, Y J ^a,b   Zu, X T ^a   Wang, B Y ^a   Jiang, X D ^b   Yuan, X D ^b   Lv, H B ^b  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Highly reflective films; Laser induced damage threshold characteristic; Sol gel; ZrO2 SiO2

Indexed keywords

1064 NM; DAMAGE MORPHOLOGY; HIGHLY REFLECTIVE FILMS; LAMBDA 900 SPECTROMETER; LASER INDUCED DAMAGE THRESHOLDS; LASER IRRADIATIONS; LASER-INDUCED DAMAGE THRESHOLD CHARACTERISTIC; NUMBER OF LAYERS; REFLECTIVITY SPECTRA; SPIN-COATING METHOD; TEMPERATURE PROFILES; TWO LAYERS; ZRO2-SIO2;

COATINGS; FILM PREPARATION; GELS; LASER DAMAGE; MORPHOLOGY; OPTICAL MICROSCOPY; REFLECTION; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; ZIRCONIUM ALLOYS;

MULTILAYER FILMS;

EID: 79956092207     PISSN: 00304026     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ijleo.2010.07.013     Document Type: Article

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