Plasma polymerization of zinc acetyl acetonate for the development of a polymer-based zinc release system

Plasma Processes and Polymers

Volumn 8, Issue 5, 2011, Pages 444-451

  Duque, Luis ^a   Förch, Renate ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

metal release; plasma polymerization; zinc acetylacetonate; ZnO nanoparticles

Indexed keywords

ANALYTICAL TOOL; ANTIMICROBIAL PROPERTY; AQUEOUS SOLUTIONS; BIOMEDICAL APPLICATIONS; COMPLEX STRUCTURE; ICP-OES; INFRARED REFLECTION ABSORPTION SPECTROSCOPY; MATERIAL CHARACTERIZATIONS; METAL RELEASE; METALLIC NANOPARTICLES; NOVEL MATERIALS; OPTICAL TECHNIQUE; ORGANIC MATRIX; PLASMA CONDITIONS; POLYMERIC MATRICES; THICKNESS OF THE FILM; THIN ORGANIC FILMS; ZINC ACETYLACETONATE; ZINC METAL; ZNO NANOPARTICLES; ZNO PARTICLES;

ABSORPTION SPECTROSCOPY; CHARACTERIZATION; DEIONIZED WATER; FUNCTIONAL POLYMERS; METAL IONS; METALLIC MATRIX COMPOSITES; METALS; NANOPARTICLES; PLASMA DIAGNOSTICS; PLASMA POLYMERIZATION; PLASMAS; POLYMER MATRIX COMPOSITES; SPECTROSCOPIC ANALYSIS; ZINC; ZINC OXIDE;

ZINC DEPOSITS;

EID: 79956031074     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000157     Document Type: Article

References (30)

1. H. J. Jeon, S. C. Yi, S. G. Oh, Biomaterials 2003, 24, 4921.
2. W. Zhang, Y. H. Zhang, J. H. Ji, J. Zhao, Q. Yan, P. K. Chu, Polymer 2006, 47, 7441.
3. C. Oehr, H. Suhr, Appl. Phys. A: Mater. Sci. Process. 1989, 49, 691.
4. H. Biederman, L. Martinu, D. Slavinska, I. Chudacek, Pure Appl. Chem. 1988, 60, 607.
5. V. Zaporojtchenko, R. Podschun, U. Schurmann, A. Kulkarni, F. Faupel, Nanotechnology 2006, 17, 4904.
6. P. Hlidek, H. Biederman, A. Choukourov, D. Slavinska, Plasma Processes Polym. 2009, 6, 34.
7. B. Despax, P. Raynaud, Plasma Processes Polym. 2007, 4, 127.
8. A. Daniel, C. Le Pen, C. Archambeau, F. Reniers, Appl. Surf. Sci. 2009, 256, S82.
9. H. Suhr, A. Etspuler, E. Feurer, C. Oehr, Plasma Chem. Plasma Process. 1988, 8, 9.
10. Y. Osada, K. Yamada, I. Yoshizawa, Thin Solid Films 1987, 151, 71.
11. T. Aoki, S. Wickramanayaka, A. M. Wrobel, Y. Nakanishi, Y. Hatanaka, J. Electrochem. Soc. 1995, 142, 166.
12. H. Suhr, Surf. Coat. Technol. 1991, 49, 233.
13. C. Oehr, H. Suhr, Appl Phys A-Mater. 1988, 45, 151.
14. C. Oehr, B. Schindler, Surf. Coat. Technol. 1998, 98, 848.
15. J. Feichtinger, R. Galm, M. Walker, K. M. Baumgartner, A. Schulz, E. Rauchle, U. Schumacher, Surf. Coat. Technol. 2001, 142, 181.
16. K. Page, M. Wilson, I. P. Parkin, J. Mater. Chem. 2009, 19, 3819.
17. J. Powel, Sci. Digest 1978, 66.
18. A. D. Russel, W. B. Hugo, Prog. Med. Chem. 1994, 31, 351.
19. E. Körner, M. H. Aguirre, G. Fortunato, A. Ritter, J. Rühe, D. Hegemann, Plasma Processes Polym. 2010, 7, 619.
20. A. Coughlan, K. Scanlon, B. P. Mahon, M. R. Towler, Biomed. Mater. Eng. 2010, 20, 99.
21. P. Petrini, C. R. Arciola, I. Pezzali, S. Bozzini, L. Montanaro, M. C. Tanzi, P. Speziale, L. Visai, Int. J. Artif. Organs 2006, 29, 434.
22. V. Khranovskyy, A. Ulyashin, G. Lashkarev, B. G. Svensson, R. Yakimova, Thin Solid Films 2008, 516, 1396.
23. H. Akasaka, K. Inazu, N. Ohtake, Jpn. J. Appl. Phys. 2008, 47, 1694.
24. M. T. van Os, B. Menges, R. Foerch, G. J. Vancso, W. Knoll, Chem. Mater. 1999, 11, 3252.
25. L. Q. Chu, W. Knoll, R. Forch, Plasma Processes Polym. 2006, 3, 498.
26. W. Knoll, MRS Bull. 1991, 16, 29.
27. M. Biesalski, J. Rühe, Langmuir 2000, 16, 1943.
28. N. Inagaki, S. Tasaka, Y. Nozue, J. Appl. Polym. Sci. 1992, 45, 1041.
29. l. G. Mar, P. Y. Timbrell, R. N. Lamb, Thin Solid Films 1993, 223, 341.
30. L. Q. Chu, R. Forch, W. Knoll, Langmuir 2006, 22, 2822.