Bubble formation due to electrical stress in organic light emitting devices

Applied Physics Letters

Volumn 80, Issue 2, 2002, Pages 171-173

  Ke, Lin ^a   Chua, Soo Jin ^a   Zhang, Keran ^a   Chen, Peng ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DARK SPOTS; DEVICE CURRENTS; ELECTRICAL STRESS; INDIUM TIN OXIDE; LIGHT EMITTING DEVICES; LOCAL CURRENT DENSITY; OPEN CIRCUITS; ORGANIC LIGHT-EMITTING DEVICES; POLY(P-PHENYLENEVINYLENE); POLYMER LAYERS; SECONDARY ION MASS SPECTROSCOPY; SHORT CIRCUIT;

CURRENT DENSITY; INDIUM COMPOUNDS; LIGHT; LIGHT EMISSION; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; TIN; TIN OXIDES;

POLYMERS;

EID: 79956002105     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1435064     Document Type: Article

References (16)

1. C. W. Tang and S. A. Vanslyke, Appl. Phys. Lett. 5, 913 (1987). apl APPLAB 0003-6951
2. B. H. Cumpston and K. F. Jensen, Appl. Phys. Lett. 69, 3941 (1996). apl APPLAB 0003-6951
3. H. Aziz, Z. D. Popovic, A. M. Hor, N. X. Hu, and G. Xu, Science 283, 900 (1999). sci SCIEAS 0036-8075
4. A. Giebeler, S. A. Whitelegg, D. G. Lidzey, P. A. Lane, and D. D. C. Bradley, Appl. Phys. Lett. 75, 2144 (1999). apl APPLAB 0003-6951
5. P. E. Burrows, V. Bulovic, S. V. Forrest, L. S. Sapochak, D. M. McCarty, and M. E. Thompson, Appl. Phys. Lett. 65, 2922 (1994). apl APPLAB 0003-6951
6. V. N. Savvate'ev, A. V. Yakimov, and D. Davidov, Appl. Phys. Lett. 71, 3344 (1997). apl APPLAB 0003-6951
7. J. McElvain, H. Antoniadis, M. R. Hueschen, J. N. Miller, D. M. Roitman, J. R. Sheats, and R. L. Moon, Appl. Phys. Lett. 80, 6002 (1996). apl APPLAB 0003-6951
8. F. Papadimitrakopoulos, X. M. Zhang, D. L. Thomsen, and K. A. Higginson, Chem. Mater. 8, 1363 (1996). cma CMATEX 0897-4756
9. S. T. Lee, Z. Q. Gao, and L. S. Hung, Appl. Phys. Lett. 74, 140 (1999). apl APPLAB 0003-6951
10. R. E. Gill, P. Van de Weijer, C. T. H. Liedenbaum, H. F. M. Schoo, A. Berntsen, J. J. M. Vleggaar, and R. J. Visser, Opt. Mater. 12, 183 (1999). oma OMATET 0925-3467
11. L. M. Do, E. M. Han, Y. Niidome, M. Fujihira, T. Kanno, S. Yoshida, A. Maeda, and A. J. Ikushidma, J. Appl. Phys. 76, 5118 (1994). jap JAPIAU 0021-8979
12. H. Aziz and G. Xu, Synth. Met. 80, 7 (1996). sym SYMEDZ 0379-6779
13. Y.-F. Liew, H. Aziz, N.-X. Hu, H. S. O. Chan, G. Xu, and Z. Popovic, Appl. Phys. Lett. 77, 2650 (2000). apl APPLAB 0003-6951
14. H. Aziz, Z. Popovic, S. Xie, A. M. Hor, N. X. Hu, C. Tripp, and G. Xu, Appl. Phys. Lett. 72, 756 (1998). apl APPLAB 0003-6951
15. Y. Park, V. E. Choong, B. R. Hsieh BR, C. W. Tang, T. Wehrmeister, K. Mullen, and Y. Gao, J. Vac. Sci. Technol. A 15, 2574 (1997). jva JVTAD6 0734-2101
16. M. Fujihira, L.-M. Do, A. Koike, and E.-M. Han, Appl. Phys. Lett. 68, 1788 (1996). apl APPLAB 0003-6951