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Volumn , Issue , 2003, Pages

Stereolithography cure modeling and simulation

Author keywords

Photopolymerization; Simulation; Stereolithography

Indexed keywords

CHEMICAL EFFECT; CROSS-LINK DENSITIES; DEGREE OF CURE; INPUT PARAMETER; MODELING AND SIMULATION; PHOTOINITIATION; POLYMER CONCENTRATIONS; PROCESS FUNDAMENTALS; PROCESS SIMULATIONS; RESIN COMPOSITION; SIMULATION; SPATIAL AND TEMPORAL DISTRIBUTION; THRESHOLD APPROACH; THRESHOLD MODEL;

EID: 79955495463     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (9)
  • 2
    • 84884951655 scopus 로고    scopus 로고
    • A review of stereolithography
    • September/October
    • Johnson D. L., "A Review of Stereolithography", RADTECH Report, September/October, 2000.
    • (2000) RADTECH Report
    • Johnson, D.L.1
  • 4
    • 79955501597 scopus 로고    scopus 로고
    • COMSOL Group, http://www.comsol.com/.
  • 6
    • 84989005710 scopus 로고
    • A process model for nonisothermal photopolymerization with a laser light source. I: Basic model development
    • Flach L. and Chartoff R. P., "A Process Model for Nonisothermal Photopolymerization with a Laser Light Source. I: Basic Model Development", Polymer Engineering and Science, 35 (6), 1995, 483-492.
    • (1995) Polymer Engineering and Science , vol.35 , Issue.6 , pp. 483-492
    • Flach, L.1    Chartoff, R.P.2
  • 7
    • 79955487778 scopus 로고    scopus 로고
    • July
    • "Technical Data Sheet: Methyl Acrylate", BASF, Corporation, July, 2001, http://www.basf.com/businesses/chemicals/acrylates/pdfs/methacry. pdf.
    • (2001) Technical Data Sheet: Methyl Acrylate


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.