Surface characterization of thin silicon-rich oxide films

Journal of Molecular Structure

Volumn 993, Issue 1-3, 2011, Pages 214-218

  Ristic D ^a,b   Holy V ^c   Ivanda, M ^b   Marcius M ^b   Buljan, M ^b   Gamulin, O ^d   Furic K ^b   Ristic M ^b   Music S ^b   Mazzola, M ^a   Chiasera, A ^a   Ferrari, M ^a   Righini, G C ^e  

^a CSMFO Lab   (Italy)

^b RUDER BO KOVI INSTITUTE   (Croatia)

^c CHARLES UNIVERSITY   (Czech Republic)

^d UNIVERSITY OF ZAGREB   (Croatia)

^e IFAC CNR   (Italy)

Author keywords

Low pressure chemical vapour deposition; Scanning electron microscopy; Silicon rich oxide; X ray reflectivity

Indexed keywords

BLUE SHIFT; BROAD BANDS; FILM INTERFACES; FILM SURFACES; HOMOGENEOUS SURFACES; HORIZONTAL TUBES; LATERAL STRUCTURES; LOW PRESSURE CHEMICAL VAPOUR DEPOSITIONS; OXYGEN CONTENT; PHONON BANDS; PHONON MODE; RAMAN SPECTRA; REACTANT GAS; ROOT MEAN SQUARE; SCANNING ELECTRONS; SILICON-RICH OXIDE; SILICON-RICH OXIDE FILMS; SPECULAR REFLECTIONS; SURFACE CHARACTERIZATION; X-RAY REFLECTIVITY;

AMORPHOUS MATERIALS; ELECTRON TUBES; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; OXYGEN; PHONONS; RAMAN SPECTROSCOPY; REFLECTION; SCANNING; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SILICON OXIDES; SUBSTRATES; SURFACE PROPERTIES; SURFACE ROUGHNESS; X RAYS;

OXIDE FILMS;

EID: 79955465028     PISSN: 00222860     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.molstruc.2010.11.066     Document Type: Conference Paper

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