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Volumn 25, Issue 4, 2011, Pages 1547-1552

Study on the kinetics of NO removal from simulated flue gas by a wet ultraviolet/H2O2 advanced oxidation process

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED OXIDATION PROCESS; ADVANCED OXIDATION PROCESSES; CHEMICAL REACTION PROCESS; DIFFUSION RATE; EXPERIMENTAL VALUES; FILM THEORY; GAS-LIQUID CONTACT AREA; KINETIC MODELS; KINETIC PROCESS; LIQUID PHASE; MASS-TRANSFER COEFFICIENT; NO ABSORPTION; NO REMOVAL; PSEUDO-FIRST-ORDER REACTION; REACTION CONDITIONS; TRANSFER REACTION; ULTRA-VIOLET;

EID: 79955378450     PISSN: 08870624     EISSN: 15205029     Source Type: Journal    
DOI: 10.1021/ef200086f     Document Type: Article
Times cited : (14)

References (36)
  • 25
    • 34249311213 scopus 로고    scopus 로고
    • Chemical Industry Press: Beijing, China
    • Xu, Y. Chemical Reaction Kinetics; Chemical Industry Press: Beijing, China, 2004.
    • (2004) Chemical Reaction Kinetics
    • Xu, Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.