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Volumn 679-680, Issue , 2011, Pages 338-341
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Shallow traps at P-doped SiO2/4H-SiC(0001) interface
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Author keywords
Interface states; SiC MOS interface; X ray photoelectron spectroscopy
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Indexed keywords
CAPACITANCE;
CHEMICAL BONDS;
CHLORINE COMPOUNDS;
ELECTRIC FIELD EFFECTS;
INTERFACE STATES;
METALS;
MOS DEVICES;
MOSFET DEVICES;
OXIDE SEMICONDUCTORS;
PHOTOELECTRONS;
PHOTONS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
SILICON CARBIDE;
SILICON OXIDES;
TEMPERATURE;
WIDE BAND GAP SEMICONDUCTORS;
X RAY PHOTOELECTRON SPECTROSCOPY;
CAPACITANCE VOLTAGE;
CHANNEL MOBILITY;
INTERFACE TRAPS;
LOW TEMPERATURES;
SHALLOW TRAPS;
SI-CMOS;
SI-SI BONDS;
THREE FOLDS;
PHOSPHORUS COMPOUNDS;
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EID: 79955086783
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/MSF.679-680.338 Document Type: Conference Paper |
Times cited : (6)
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References (14)
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