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Volumn 679-680, Issue , 2011, Pages 338-341

Shallow traps at P-doped SiO2/4H-SiC(0001) interface

Author keywords

Interface states; SiC MOS interface; X ray photoelectron spectroscopy

Indexed keywords

CAPACITANCE; CHEMICAL BONDS; CHLORINE COMPOUNDS; ELECTRIC FIELD EFFECTS; INTERFACE STATES; METALS; MOS DEVICES; MOSFET DEVICES; OXIDE SEMICONDUCTORS; PHOTOELECTRONS; PHOTONS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON CARBIDE; SILICON OXIDES; TEMPERATURE; WIDE BAND GAP SEMICONDUCTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79955086783     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.679-680.338     Document Type: Conference Paper
Times cited : (6)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.