Application of genetic algorithm in the modeling of leaf chlorophyll level based on VIS/NIR reflection spectroscopy

IFIP Advances in Information and Communication Technology

Volumn 293, Issue , 2009, Pages 179-188

  Yang, Haiqing ^a,b   He, Yong ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b ZHEJIANG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Genetic algorithm; Leaf chlorophyll level; Leaf thickness; VIS NIR reflection spectroscopy

Indexed keywords

AGRICULTURE; ALGORITHMS; CHLOROPHYLL; ELECTROMAGNETIC WAVE REFLECTION; GENETIC ALGORITHMS; OPTIMIZATION; UNCERTAINTY ANALYSIS; VISUAL BASIC;

LEAF CHLOROPHYLL; LEAF THICKNESS; MODEL VERIFICATION; PARAMETER OPTIMIZATION; PREDICTION EQUATIONS; QUANTITATIVE DETERMINATIONS; REFLECTION SPECTROSCOPY; UNCERTAIN PARAMETERS;

SPECTROMETERS;

EID: 79955071013     PISSN: 18684238     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (11)

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