Fabrication and photocatalytic activity of ZnO prepared by different precipitants using paralled flaw precipitation method

Materials Letters

Volumn 65, Issue 12, 2011, Pages 1995-1997

  Zhong, Jun Bo ^a   Xu, Bin ^a   Feng, Fa Mei ^a   He, Xi Yang ^a   Li, Jian Zhang ^a   Hu, Wei ^a  

^a SICHUAN UNIVERSITY OF SCIENCE AND ENGINEERING   (China)

Author keywords

Photocatalytic performance; Powder technology; Semiconductors; ZnO

Indexed keywords

AVERAGE SIZE; BET SURFACE AREA; NANO-STRUCTURED; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC PERFORMANCE; PORE VOLUME; POWDER TECHNOLOGY; PRECIPITATION METHODS; SEM; SEMICONDUCTORS; WEAK BASE; XRD; ZNO;

PHOTOCATALYSIS; PHOTOCATALYSTS; PRECIPITATION (CHEMICAL);

ZINC OXIDE;

EID: 79954994408     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2011.03.063     Document Type: Article

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