Solid state photopolymerization of acrylic acid at low temperature

Polymers for Advanced Technologies

Volumn 22, Issue 5, 2011, Pages 738-742

  Dai, Mingzhi ^a   Xiao, Ming ^a   Xiao, Pu ^a   Nie, Jun ^a  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

Acrylic acid; Low temperature; Photopolymerization; SEM

Indexed keywords

ACRYLIC ACIDS; CHAIN COMPONENTS; CURED FILMS; DOUBLE BONDS; KINETIC CHARACTERISTICS; LOW TEMPERATURES; PEG-400; PHOTO-INITIATOR; PHOTOINITIATORS; POLYETHYLENE GLYCOL 400; POST-CURING; REACTION SYSTEM; ROOM TEMPERATURE; SEM;

CARBOXYLIC ACIDS; CURING; INFRARED SPECTROSCOPY; ORGANIC ACIDS; PHOTOGRAPHY; PHOTOPOLYMERIZATION; POLYETHYLENE GLYCOLS; POLYETHYLENE OXIDES; POLYETHYLENES;

WATER CONTENT;

EID: 79954597881     PISSN: 10427147     EISSN: 10991581     Source Type: Journal    
DOI: 10.1002/pat.1574     Document Type: Article

References (31)

1. C. E. Corcione, A. Greco, A. Maffezzoli, Polymer 2005, 46, 8018.
2. W. B. Li, H. Cao, M. Kashima, J. Polym. Sci., Part B: Polym. Phys. 2008, 46, 2090.
3. G. Francesco, G. Fabrizio, B. Matthias, Polymer 2008, 49, 4332.
4. A. Remi, C. Gael, R. J. Jacques, Macromol. Chem. Phys. 2007, 208, 690.
5. N. Camilla, S. Neil, M. Michael, J. Polym. Sci., Part A: Polym. Chem. 2008, 46, 1339.
6. S. Tasic, B. Bozic, B. Dunjic, Prog. Org. Coat. 2004, 51, 320.
7. Y. W. Chen-Yang, S. Y. Chen, C. Y. Yuan, Macromolecules 2005; 38, 2710.
8. X. Gao, J. Nie, Polym. Int. 2007, 56, 707.
9. K. K. Baikerikar, A. B. Scranton, J. Appl. Polym. Sci. 2001; 81, 3449.
10. K. K. Baikerikar, A. B. Scranton, Polymer, 2000, 42, 431.
11. J. Munoz, A. Bratov, R. Mas, J. Electrochem. Soc. 1996, 143, 2020.
12. T. Scherzer, U. Decker, Polymer 2000, 41, 7681.
13. P. K. Bhowmik, H. Han, A. K. Nedeltchev, Polymer 2006, 47, 8281.
14. T. Y. Lee, W. Kaung, E. Sonny Jonsson, K. Lowery, C. A. Guymon, C. E. Hoyle, J. Polym. Sci., Part A: Polym. Chem. 2004, 42, 4424.
15. W. D. Cook, Polymer 1992; 33, 2152.
16. A. T. Doornkamp, Y. Y. Tan, Polym. Commun. 1990, 31, 362.
17. D. J. Broer, G. N. Mol, G. Challa, Polymer 1991, 32, 690.
18. T. Scherzer, H. Langguth, Macromol. Chem. Phys. 2005, 206, 240.
19. Z. G. Chen, D. C. Webster, Polym. Int. 2007; 56, 754.
20. W. H. Lu, W. J. Xu, Y. M. Wu, Prog. Org. Coat. 2006, 56, 252.
21. B. Lu, P. Xiao, M. Z. Sun, J. Nie, J. Appl. Polym. Sci. 2007, 104, 1126.
22. R. J. Woods, A. K. Pikaev, Applied Radiation Chemistry: Radiation Processing. Wiley-Interscience, 1993.
23. I. Kaetsu, K. Yoshida, H. Okubo, F. Yoshii, K. Hayashi, Radiat. Phys. Chem. 1977, 14, 737.
24. I. Kaetsu, M. Kumakura, F. Yoshi, K. Yoshida, Radiat. Phys. Chem. 1985, 25, 879.
25. F. Ferrero, G. Malucelli, Prog. Org. Coat. 2005, 54, 337.
26. S. K. Rath, F. Y. C. Boey, M. J. M. Abadie, Polym. Int. 2004, 53, 857.
27. S. A. Shama, J. Photopolym. Sci. Technol. 1991, 4, 9.
28. H. Matsumura, N. Tanoue, M. Atsuta, S. Kitazawa, J. Dent. Res. 1997, 76, 688.
29. J. A. Burdick, A. J. Peterson, K. S. Anseth, Biomaterials 2001, 22, 1779.
30. T. M. Lovestead, C. N. Bowman, Macromolecules 2005, 38, 4913.
31. M. E. Adams, G. T. Russell, B. S. Casey, Macromolecules 1990, 23, 4624.