Extraordinary Hall effect in nanoscale nickel films

Thin Solid Films

Volumn 519, Issue 13, 2011, Pages 4329-4333

  Volkov, V ^a   Levashov, V ^a   Matveev, V ^a   Matveeva, L ^a   Khodos, I ^a   Kasumov, Yu ^a  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

Electron beam evaporation; Extraordinary Hall coefficients; Hall effect; Hall resistance; Nickel; Sputtering; Thin films

Indexed keywords

DIODE SPUTTERING; ELECTRON BEAM EVAPORATION; EXTRAORDINARY HALL EFFECT; FACE-CENTERED CUBIC; FCC PHASE; GROWTH STAGES; HALL COEFFICIENT; HALL RESISTANCE; IN-FIELD; NANO SCALE; NICKEL FILM; NONMAGNETICS; PLASMA SPUTTERING; RADIO FREQUENCIES; TETRAGONAL LATTICES; UNIFORM FILMS;

ELECTRONS; EVAPORATION; FILM GROWTH; GYRATORS; HALL EFFECT; MAGNETIC FIELD EFFECTS; METALLIC FILMS; NICKEL; PHASE TRANSITIONS; THIN FILMS;

FILM PREPARATION;

EID: 79954431648     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.377     Document Type: Article

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