Growth of rutile titanium dioxide nanowires by pulsed chemical vapor deposition

Crystal Growth and Design

Volumn 11, Issue 4, 2011, Pages 949-954

  Shi, Jian ^a   Wang, Xudong ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; ANATASE TIO; CONTROL EXPERIMENTS; CRYSTALLINITIES; DEPOSITION CONDITIONS; DEPOSITION TEMPERATURES; GROWTH BEHAVIOR; HIGH INDEX SURFACE; HIGH QUALITY; LARGE SURFACE AREA; PARTICLE FORMATIONS; PRECURSOR MOLECULES; PULSED CVD; RUTILE TIO; SEEDING LAYERS; SUBMICROMETERS; TIO;

CRYSTAL GROWTH; DEPOSITION; FILM GROWTH; GOLD; GOLD COATINGS; NANORODS; NANOWIRES; OXIDE MINERALS; SURFACE REACTIONS; TITANIUM; TITANIUM DIOXIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 79953893290     PISSN: 15287483     EISSN: 15287505     Source Type: Journal    
DOI: 10.1021/cg200140k     Document Type: Article

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