Atomic force microscopy study of self-assembly behaviors of hydrophobic poly(n-butyl methacrylate)-block-polydimethylsiloxane-block-poly(n-butyl methacrylate) ABA triblock copolymers

Polymer International

Volumn 60, Issue 5, 2011, Pages 798-806

  Wang, Huanbing ^a   Tao, Qingsheng ^a   Wang, Jinfang ^a   Khoshdel, Ezat ^b  

^a Unilever R and D   (China)

^b UNILEVER RESEARCH   (United Kingdom)

Author keywords

AFM; Block copolymers; PDMS; Self assembly

Indexed keywords

ABA TRIBLOCK COPOLYMER; AFM; CHLOROFORM SOLUTIONS; CYLINDRICAL PORES; MACROINITIATORS; PDMS; POLY(N-BUTYL METHACRYLATE) (PN-BMA); SELF-ASSEMBLY BEHAVIORS; SEMI-CONTINUOUS; SPHERICAL STRUCTURES; SUBSTRATE NATURE; TRIBLOCK COPOLYMERS;

ATOM TRANSFER RADICAL POLYMERIZATION; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; CHEMICAL INDUSTRY; CHLORINE COMPOUNDS; COPOLYMERIZATION; CYLINDERS (SHAPES); ISOMERS; MICA; MICROCHANNELS; PLASTIC COATINGS; PLASTIC PRODUCTS; SELF ASSEMBLY; SEMICONDUCTING SILICON COMPOUNDS; SILICATE MINERALS; SILICON WAFERS;

SILICONES;

EID: 79953879689     PISSN: 09598103     EISSN: 10970126     Source Type: Journal    
DOI: 10.1002/pi.3018     Document Type: Article

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