Fabrication of crystalline Si spheres with atomic-scale surface smoothness using homogenized KrF excimer laser reformation system

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 27, Issue 3, 2009, Pages 1156-1160

  Hung, Shih Che ^a   Shiu, Shu Chia ^a   Chao, Cha Hsin ^a   Lin, Ching Fuh ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; EXCIMER LASERS; FABRICATION; GAS LASERS; KRYPTON; SPHERES; SURFACE TENSION;

ATOMIC SCALE; CRYSTALLINE PROPERTIES; CRYSTALLINE SI; HIGH-POWER; KRF EXCIMER LASER; LATTICE PLANE; ROOT MEAN SQUARE ROUGHNESS; SILICON ON INSULATOR; SINGLE-CRYSTALLINE; SMOOTH SURFACE; SUBMICROMETERS; SURFACE SMOOTHNESS; TUNNELING ELECTRON MICROSCOPY;

SILICON;

EID: 79953859779     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3137963     Document Type: Conference Paper

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